Solar-induced chemical vapor deposition of diamond-type carbon films
Abstract
An improved chemical vapor deposition method for depositing transparent continuous coatings of sp.sup.3 -bonded diamond-type carbon films, comprising: a) providing a volatile hydrocarbon gas/H.sub.2 reactant mixture in a cold wall vacuum/chemical vapor deposition chamber containing a suitable substrate for said films, at pressure of about 1 to 50 Torr; and b) directing a concentrated solar flux of from about 40 to about 60 watts/cm.sup.2 through said reactant mixture to produce substrate temperatures of about 750.degree. C. to about 950.degree. C. to activate deposition of the film on said substrate.
- Inventors:
-
- Lakewood, CO
- Golden, CO
- Beaverton, OR
- Issue Date:
- Research Org.:
- Midwest Research Institute, Kansas City, MO (United States)
- OSTI Identifier:
- 869491
- Patent Number(s):
- 5346729
- Assignee:
- Midwest Research Institute (Kansas City, MO)
- Patent Classifications (CPCs):
-
C - CHEMISTRY C23 - COATING METALLIC MATERIAL C23C - COATING METALLIC MATERIAL
Y - NEW / CROSS SECTIONAL TECHNOLOGIES Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC Y10S - TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- DOE Contract Number:
- AC02-83CH10093
- Resource Type:
- Patent
- Country of Publication:
- United States
- Language:
- English
- Subject:
- solar-induced; chemical; vapor; deposition; diamond-type; carbon; films; improved; method; depositing; transparent; continuous; coatings; sp; -bonded; comprising; providing; volatile; hydrocarbon; gas; reactant; mixture; cold; wall; vacuum; chamber; containing; suitable; substrate; pressure; 50; torr; directing; concentrated; solar; flux; 40; 60; watts; cm; produce; temperatures; 750; degree; 950; activate; film; solar flux; reactant mixture; deposition method; hydrocarbon gas; deposition chamber; chemical vapor; vapor deposition; chamber containing; carbon film; suitable substrate; substrate temperature; carbon films; substrate temperatures; concentrated solar; rate temperature; wall vacuum; improved chemical; type carbon; volatile hydrocarbon; diamond-type carbon; continuous coating; /427/423/
Citation Formats
Pitts, J Roland, Tracy, C Edwin, King, David E, and Stanley, James T. Solar-induced chemical vapor deposition of diamond-type carbon films. United States: N. p., 1994.
Web.
Pitts, J Roland, Tracy, C Edwin, King, David E, & Stanley, James T. Solar-induced chemical vapor deposition of diamond-type carbon films. United States.
Pitts, J Roland, Tracy, C Edwin, King, David E, and Stanley, James T. Sat .
"Solar-induced chemical vapor deposition of diamond-type carbon films". United States. https://www.osti.gov/servlets/purl/869491.
@article{osti_869491,
title = {Solar-induced chemical vapor deposition of diamond-type carbon films},
author = {Pitts, J Roland and Tracy, C Edwin and King, David E and Stanley, James T},
abstractNote = {An improved chemical vapor deposition method for depositing transparent continuous coatings of sp.sup.3 -bonded diamond-type carbon films, comprising: a) providing a volatile hydrocarbon gas/H.sub.2 reactant mixture in a cold wall vacuum/chemical vapor deposition chamber containing a suitable substrate for said films, at pressure of about 1 to 50 Torr; and b) directing a concentrated solar flux of from about 40 to about 60 watts/cm.sup.2 through said reactant mixture to produce substrate temperatures of about 750.degree. C. to about 950.degree. C. to activate deposition of the film on said substrate.},
doi = {},
journal = {},
number = ,
volume = ,
place = {United States},
year = {Sat Jan 01 00:00:00 EST 1994},
month = {Sat Jan 01 00:00:00 EST 1994}
}
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