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Title: Solar-induced chemical vapor deposition of diamond-type carbon films

An improved chemical vapor deposition method for depositing transparent continuous coatings of sp[sup 3]-bonded diamond-type carbon films, comprises: (a) providing a volatile hydrocarbon gas/H[sub 2] reactant mixture in a cold wall vacuum/chemical vapor deposition chamber containing a suitable substrate for said films, at pressure of about 1 to 50 Torr; and (b) directing a concentrated solar flux of from about 40 to about 60 watts/cm[sup 2] through said reactant mixture to produce substrate temperatures of about 750 C to about 950 C to activate deposition of the film on said substrate. 11 figs.
Inventors:
; ; ;
Issue Date:
OSTI Identifier:
6954543
Assignee:
Midwest Research Inst., Kansas City, MO (United States) PTO; EDB-94-150827
Patent Number(s):
US 5346729; A
Application Number:
PPN: US 8-062840
Contract Number:
AC02-83CH10093
Resource Relation:
Patent File Date: 17 May 1993
Country of Publication:
United States
Language:
English
Subject:
14 SOLAR ENERGY; 36 MATERIALS SCIENCE; CHEMICAL REACTORS; SOLAR HEATING; DIAMONDS; CHEMICAL VAPOR DEPOSITION; SOLAR PROCESS HEAT; THIN FILMS; CARBON; CHEMICAL COATING; DEPOSITION; ELEMENTAL MINERALS; ELEMENTS; ENERGY; FILMS; HEAT; HEATING; MINERALS; NONMETALS; PROCESS HEAT; SURFACE COATING; 140905*; 360601 - Other Materials- Preparation & Manufacture