Solar-induced chemical vapor deposition of diamond-type carbon films
Abstract
An improved chemical vapor deposition method for depositing transparent continuous coatings of sp[sup 3]-bonded diamond-type carbon films, comprises: (a) providing a volatile hydrocarbon gas/H[sub 2] reactant mixture in a cold wall vacuum/chemical vapor deposition chamber containing a suitable substrate for said films, at pressure of about 1 to 50 Torr; and (b) directing a concentrated solar flux of from about 40 to about 60 watts/cm[sup 2] through said reactant mixture to produce substrate temperatures of about 750 C to about 950 C to activate deposition of the film on said substrate. 11 figs.
- Inventors:
- Issue Date:
- OSTI Identifier:
- 6954543
- Patent Number(s):
- 5346729
- Application Number:
- PPN: US 8-062840
- Assignee:
- Midwest Research Inst., Kansas City, MO (United States)
- DOE Contract Number:
- AC02-83CH10093
- Resource Type:
- Patent
- Resource Relation:
- Patent File Date: 17 May 1993
- Country of Publication:
- United States
- Language:
- English
- Subject:
- 14 SOLAR ENERGY; 36 MATERIALS SCIENCE; CHEMICAL REACTORS; SOLAR HEATING; DIAMONDS; CHEMICAL VAPOR DEPOSITION; SOLAR PROCESS HEAT; THIN FILMS; CARBON; CHEMICAL COATING; DEPOSITION; ELEMENTAL MINERALS; ELEMENTS; ENERGY; FILMS; HEAT; HEATING; MINERALS; NONMETALS; PROCESS HEAT; SURFACE COATING; 140905*; 360601 - Other Materials- Preparation & Manufacture
Citation Formats
Pitts, J R, Tracy, C E, King, D E, and Stanley, J T. Solar-induced chemical vapor deposition of diamond-type carbon films. United States: N. p., 1994.
Web.
Pitts, J R, Tracy, C E, King, D E, & Stanley, J T. Solar-induced chemical vapor deposition of diamond-type carbon films. United States.
Pitts, J R, Tracy, C E, King, D E, and Stanley, J T. Tue .
"Solar-induced chemical vapor deposition of diamond-type carbon films". United States.
@article{osti_6954543,
title = {Solar-induced chemical vapor deposition of diamond-type carbon films},
author = {Pitts, J R and Tracy, C E and King, D E and Stanley, J T},
abstractNote = {An improved chemical vapor deposition method for depositing transparent continuous coatings of sp[sup 3]-bonded diamond-type carbon films, comprises: (a) providing a volatile hydrocarbon gas/H[sub 2] reactant mixture in a cold wall vacuum/chemical vapor deposition chamber containing a suitable substrate for said films, at pressure of about 1 to 50 Torr; and (b) directing a concentrated solar flux of from about 40 to about 60 watts/cm[sup 2] through said reactant mixture to produce substrate temperatures of about 750 C to about 950 C to activate deposition of the film on said substrate. 11 figs.},
doi = {},
journal = {},
number = ,
volume = ,
place = {United States},
year = {1994},
month = {9}
}