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Title: Solar-induced chemical vapor deposition of diamond-type carbon films

Abstract

An improved chemical vapor deposition method for depositing transparent continuous coatings of sp[sup 3]-bonded diamond-type carbon films, comprises: (a) providing a volatile hydrocarbon gas/H[sub 2] reactant mixture in a cold wall vacuum/chemical vapor deposition chamber containing a suitable substrate for said films, at pressure of about 1 to 50 Torr; and (b) directing a concentrated solar flux of from about 40 to about 60 watts/cm[sup 2] through said reactant mixture to produce substrate temperatures of about 750 C to about 950 C to activate deposition of the film on said substrate. 11 figs.

Inventors:
; ; ;
Issue Date:
OSTI Identifier:
6954543
Patent Number(s):
5346729 A
Application Number:
PPN: US 8-062840
Assignee:
Midwest Research Inst., Kansas City, MO (United States)
DOE Contract Number:  
AC02-83CH10093
Resource Type:
Patent
Resource Relation:
Patent File Date: 17 May 1993
Country of Publication:
United States
Language:
English
Subject:
14 SOLAR ENERGY; 36 MATERIALS SCIENCE; CHEMICAL REACTORS; SOLAR HEATING; DIAMONDS; CHEMICAL VAPOR DEPOSITION; SOLAR PROCESS HEAT; THIN FILMS; CARBON; CHEMICAL COATING; DEPOSITION; ELEMENTAL MINERALS; ELEMENTS; ENERGY; FILMS; HEAT; HEATING; MINERALS; NONMETALS; PROCESS HEAT; SURFACE COATING; 140905*; 360601 - Other Materials- Preparation & Manufacture

Citation Formats

Pitts, J R, Tracy, C E, King, D E, and Stanley, J T. Solar-induced chemical vapor deposition of diamond-type carbon films. United States: N. p., 1994. Web.
Pitts, J R, Tracy, C E, King, D E, & Stanley, J T. Solar-induced chemical vapor deposition of diamond-type carbon films. United States.
Pitts, J R, Tracy, C E, King, D E, and Stanley, J T. Tue . "Solar-induced chemical vapor deposition of diamond-type carbon films". United States.
@article{osti_6954543,
title = {Solar-induced chemical vapor deposition of diamond-type carbon films},
author = {Pitts, J R and Tracy, C E and King, D E and Stanley, J T},
abstractNote = {An improved chemical vapor deposition method for depositing transparent continuous coatings of sp[sup 3]-bonded diamond-type carbon films, comprises: (a) providing a volatile hydrocarbon gas/H[sub 2] reactant mixture in a cold wall vacuum/chemical vapor deposition chamber containing a suitable substrate for said films, at pressure of about 1 to 50 Torr; and (b) directing a concentrated solar flux of from about 40 to about 60 watts/cm[sup 2] through said reactant mixture to produce substrate temperatures of about 750 C to about 950 C to activate deposition of the film on said substrate. 11 figs.},
doi = {},
journal = {},
number = ,
volume = ,
place = {United States},
year = {1994},
month = {9}
}