Method and apparatus for fabricating a thin-film solar cell utilizing a hot wire chemical vapor deposition technique
Abstract
A thin-film solar cell is provided. The thin-film solar cell comprises an a-SiGe:H (1.6 eV) n-i-p solar cell having a deposition rate of at least ten (10) .ANG./second for the a-SiGe:H intrinsic layer by hot wire chemical vapor deposition. A method for fabricating a thin film solar cell is also provided. The method comprises depositing a n-i-p layer at a deposition rate of at least ten (10) .ANG./second for the a-SiGe:H intrinsic layer.
- Inventors:
- Issue Date:
- Research Org.:
- National Renewable Energy Laboratory (NREL), Golden, CO (United States)
- Sponsoring Org.:
- USDOE
- OSTI Identifier:
- 1175951
- Patent Number(s):
- 7122736
- Application Number:
- 10/485,715
- Assignee:
- Midwest Research Institute (Kansas City, MO)
- Patent Classifications (CPCs):
-
H - ELECTRICITY H01 - BASIC ELECTRIC ELEMENTS H01L - SEMICONDUCTOR DEVICES
Y - NEW / CROSS SECTIONAL TECHNOLOGIES Y02 - TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE Y02E - REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
- DOE Contract Number:
- AC36-99GO10337
- Resource Type:
- Patent
- Resource Relation:
- Patent File Date: 2001 Aug 16
- Country of Publication:
- United States
- Language:
- English
- Subject:
- 14 SOLAR ENERGY
Citation Formats
Wang, Qi, and Iwaniczko, Eugene. Method and apparatus for fabricating a thin-film solar cell utilizing a hot wire chemical vapor deposition technique. United States: N. p., 2006.
Web.
Wang, Qi, & Iwaniczko, Eugene. Method and apparatus for fabricating a thin-film solar cell utilizing a hot wire chemical vapor deposition technique. United States.
Wang, Qi, and Iwaniczko, Eugene. Tue .
"Method and apparatus for fabricating a thin-film solar cell utilizing a hot wire chemical vapor deposition technique". United States. https://www.osti.gov/servlets/purl/1175951.
@article{osti_1175951,
title = {Method and apparatus for fabricating a thin-film solar cell utilizing a hot wire chemical vapor deposition technique},
author = {Wang, Qi and Iwaniczko, Eugene},
abstractNote = {A thin-film solar cell is provided. The thin-film solar cell comprises an a-SiGe:H (1.6 eV) n-i-p solar cell having a deposition rate of at least ten (10) .ANG./second for the a-SiGe:H intrinsic layer by hot wire chemical vapor deposition. A method for fabricating a thin film solar cell is also provided. The method comprises depositing a n-i-p layer at a deposition rate of at least ten (10) .ANG./second for the a-SiGe:H intrinsic layer.},
doi = {},
journal = {},
number = ,
volume = ,
place = {United States},
year = {2006},
month = {10}
}
Works referenced in this record:
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