Coated substrates and process
Abstract
Disclosed herein is a coated substrate and a process for forming films on substrates and for providing a particularly smooth film on a substrate. The method of this invention involves subjecting a surface of a substrate to contact with a stream of ions of an inert gas having sufficient force and energy to substantially change the surface characteristics of said substrate, and then exposing a film-forming material to a stream of ions of an inert gas having sufficient energy to vaporize the atoms of said film-forming material and to transmit the vaporized atoms to the substrate surface with sufficient force to form a film bonded to the substrate. This process is particularly useful commercially because it forms strong bonds at room temperature. This invention is particularly useful for adhering a gold film to diamond and forming ohmic electrodes on diamond, but also can be used to bond other films to substrates.
- Inventors:
-
- Chapel Hill, NC
- Issue Date:
- OSTI Identifier:
- 868074
- Patent Number(s):
- 5068020
- Assignee:
- University of North Carolina at Chapel Hill (Chapel Hill, NC)
- Patent Classifications (CPCs):
-
C - CHEMISTRY C23 - COATING METALLIC MATERIAL C23C - COATING METALLIC MATERIAL
- Resource Type:
- Patent
- Country of Publication:
- United States
- Language:
- English
- Subject:
- coated; substrates; process; disclosed; substrate; forming; films; providing; particularly; smooth; film; method; involves; subjecting; surface; contact; stream; inert; gas; sufficient; force; energy; substantially; change; characteristics; exposing; film-forming; material; vaporize; atoms; transmit; vaporized; form; bonded; useful; commercially; forms; strong; bonds; temperature; adhering; gold; diamond; ohmic; electrodes; bond; strong bond; coated substrates; sufficient energy; particularly useful; inert gas; substrate surface; coated substrate; surface characteristics; process disclosed; ohmic electrode; forming material; sufficient force; film bonded; strong bonds; involves subjecting; /204/
Citation Formats
Chu, Wei-kan, and Childs, Charles B. Coated substrates and process. United States: N. p., 1991.
Web.
Chu, Wei-kan, & Childs, Charles B. Coated substrates and process. United States.
Chu, Wei-kan, and Childs, Charles B. Tue .
"Coated substrates and process". United States. https://www.osti.gov/servlets/purl/868074.
@article{osti_868074,
title = {Coated substrates and process},
author = {Chu, Wei-kan and Childs, Charles B},
abstractNote = {Disclosed herein is a coated substrate and a process for forming films on substrates and for providing a particularly smooth film on a substrate. The method of this invention involves subjecting a surface of a substrate to contact with a stream of ions of an inert gas having sufficient force and energy to substantially change the surface characteristics of said substrate, and then exposing a film-forming material to a stream of ions of an inert gas having sufficient energy to vaporize the atoms of said film-forming material and to transmit the vaporized atoms to the substrate surface with sufficient force to form a film bonded to the substrate. This process is particularly useful commercially because it forms strong bonds at room temperature. This invention is particularly useful for adhering a gold film to diamond and forming ohmic electrodes on diamond, but also can be used to bond other films to substrates.},
doi = {},
journal = {},
number = ,
volume = ,
place = {United States},
year = {Tue Jan 01 00:00:00 EST 1991},
month = {Tue Jan 01 00:00:00 EST 1991}
}