Low work function, stable thin films

Dinh, Long N; Balooch, Mehdi; Schildbach, Marcus A

Title: Low work function, stable thin films

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Abstract

Generation of low work function, stable compound thin films by laser ablation. Compound thin films with low work function can be synthesized by simultaneously laser ablating silicon, for example, and thermal evaporating an alkali metal into an oxygen environment. For example, the compound thin film may be composed of Si/Cs/O. The work functions of the thin films can be varied by changing the silicon/alkali metal/oxygen ratio. Low work functions of the compound thin films deposited on silicon substrates were confirmed by ultraviolet photoelectron spectroscopy (UPS). The compound thin films are stable up to 500.degree. C. as measured by x-ray photoelectron spectroscopy (XPS). Tests have established that for certain chemical compositions and annealing temperatures of the compound thin films, negative electron affinity (NEA) was detected. The low work function, stable compound thin films can be utilized in solar cells, field emission flat panel displays, electron guns, and cold cathode electron guns.

Inventors:

Dinh, Long N ^[1]; McLean, II, William ^[2]; Balooch, Mehdi ^[3]; Fehring, Jr., Edward J. ^[4]; Schildbach, Marcus A ^[5]

Concord, CA
(Oakland, CA)
Berkeley, CA
(Dublin, CA)
Livermore, CA

Issue Date:: 2000-01-01

Research Org.:: Lawrence Livermore National Laboratory (LLNL), Livermore, CA (United States)

OSTI Identifier:: 873453

Patent Number(s):: 6162707

Assignee:: Regents of University of California (Oakland, CA)

Patent Classifications (CPCs):: C - CHEMISTRY C23 - COATING METALLIC MATERIAL C23C - COATING METALLIC MATERIAL

Y - NEW / CROSS SECTIONAL TECHNOLOGIES Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC Y10S - TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS

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C - CHEMISTRY C23 - COATING METALLIC MATERIAL C23C - COATING METALLIC MATERIAL
C23C14/08 - Oxides
C23C14/28 - by wave energy or particle radiation

Y - NEW / CROSS SECTIONAL TECHNOLOGIES Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC Y10S - TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
Y10S117/904 - Laser beam
Y10S438/93 - Ternary or quaternary semiconductor comprised of elements from three different groups, e.g. I-III-V

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DOE Contract Number:: W-7405-ENG-48

Resource Type:: Patent

Country of Publication:: United States

Language:: English

Subject:: function; stable; films; generation; compound; laser; ablation; synthesized; simultaneously; ablating; silicon; example; thermal; evaporating; alkali; metal; oxygen; environment; film; composed; cs; functions; varied; changing; ratio; deposited; substrates; confirmed; ultraviolet; photoelectron; spectroscopy; 500; degree; measured; x-ray; xps; tests; established; chemical; compositions; annealing; temperatures; negative; electron; affinity; nea; detected; utilized; solar; cells; field; emission; flat; panel; displays; guns; cold; cathode; films deposited; chemical compositions; silicon substrates; chemical composition; cold cathode; solar cell; alkali metal; solar cells; silicon substrate; field emission; electron gun; laser ablation; flat panel; electron affinity; panel displays; panel display; stable compound; annealing temperature; x-ray photoelectron; annealing temperatures; oxygen ratio; oxygen environment; negative electron; cathode electron; emission flat; simultaneously laser; thermal evaporating; electron spectroscopy; ablating silicon; laser ablating; /438/117/

Citation Formats


                    Dinh, Long N, McLean, II, William, Balooch, Mehdi, Fehring, Jr., Edward J., and Schildbach, Marcus A. Low work function, stable thin films.  United States: N. p., 2000. 
        Web.

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                    Dinh, Long N, McLean, II, William, Balooch, Mehdi, Fehring, Jr., Edward J., & Schildbach, Marcus A. Low work function, stable thin films.  United States.

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                    Dinh, Long N, McLean, II, William, Balooch, Mehdi, Fehring, Jr., Edward J., and Schildbach, Marcus A. Sat .  
        "Low work function, stable thin films".  United States.  https://www.osti.gov/servlets/purl/873453.

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@article{osti_873453,

  title        = {Low work function, stable thin films},

  author       = {Dinh, Long N and McLean, II, William and Balooch, Mehdi and Fehring, Jr., Edward J. and Schildbach, Marcus A},

  abstractNote = {Generation of low work function, stable compound thin films by laser ablation. Compound thin films with low work function can be synthesized by simultaneously laser ablating silicon, for example, and thermal evaporating an alkali metal into an oxygen environment. For example, the compound thin film may be composed of Si/Cs/O. The work functions of the thin films can be varied by changing the silicon/alkali metal/oxygen ratio. Low work functions of the compound thin films deposited on silicon substrates were confirmed by ultraviolet photoelectron spectroscopy (UPS). The compound thin films are stable up to 500.degree. C. as measured by x-ray photoelectron spectroscopy (XPS). Tests have established that for certain chemical compositions and annealing temperatures of the compound thin films, negative electron affinity (NEA) was detected. The low work function, stable compound thin films can be utilized in solar cells, field emission flat panel displays, electron guns, and cold cathode electron guns.},

  doi          = {},

  journal      = {},
number       = ,

  volume       = ,

  place        = {United States},

  year         = {2000},

  month        = {1}

}

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