Low work function, stable thin films
Abstract
Generation of low work function, stable compound thin films by laser ablation. Compound thin films with low work function can be synthesized by simultaneously laser ablating silicon, for example, and thermal evaporating an alkali metal into an oxygen environment. For example, the compound thin film may be composed of Si/Cs/O. The work functions of the thin films can be varied by changing the silicon/alkali metal/oxygen ratio. Low work functions of the compound thin films deposited on silicon substrates were confirmed by ultraviolet photoelectron spectroscopy (UPS). The compound thin films are stable up to 500.degree. C. as measured by x-ray photoelectron spectroscopy (XPS). Tests have established that for certain chemical compositions and annealing temperatures of the compound thin films, negative electron affinity (NEA) was detected. The low work function, stable compound thin films can be utilized in solar cells, field emission flat panel displays, electron guns, and cold cathode electron guns.
- Inventors:
-
- Concord, CA
- (Oakland, CA)
- Berkeley, CA
- (Dublin, CA)
- Livermore, CA
- Issue Date:
- Research Org.:
- Lawrence Livermore National Laboratory (LLNL), Livermore, CA (United States)
- OSTI Identifier:
- 873453
- Patent Number(s):
- 6162707
- Assignee:
- Regents of University of California (Oakland, CA)
- Patent Classifications (CPCs):
-
C - CHEMISTRY C23 - COATING METALLIC MATERIAL C23C - COATING METALLIC MATERIAL
Y - NEW / CROSS SECTIONAL TECHNOLOGIES Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC Y10S - TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- DOE Contract Number:
- W-7405-ENG-48
- Resource Type:
- Patent
- Country of Publication:
- United States
- Language:
- English
- Subject:
- function; stable; films; generation; compound; laser; ablation; synthesized; simultaneously; ablating; silicon; example; thermal; evaporating; alkali; metal; oxygen; environment; film; composed; cs; functions; varied; changing; ratio; deposited; substrates; confirmed; ultraviolet; photoelectron; spectroscopy; 500; degree; measured; x-ray; xps; tests; established; chemical; compositions; annealing; temperatures; negative; electron; affinity; nea; detected; utilized; solar; cells; field; emission; flat; panel; displays; guns; cold; cathode; films deposited; chemical compositions; silicon substrates; chemical composition; cold cathode; solar cell; alkali metal; solar cells; silicon substrate; field emission; electron gun; laser ablation; flat panel; electron affinity; panel displays; panel display; stable compound; annealing temperature; x-ray photoelectron; annealing temperatures; oxygen ratio; oxygen environment; negative electron; cathode electron; emission flat; simultaneously laser; thermal evaporating; electron spectroscopy; ablating silicon; laser ablating; /438/117/
Citation Formats
Dinh, Long N, McLean, II, William, Balooch, Mehdi, Fehring, Jr., Edward J., and Schildbach, Marcus A. Low work function, stable thin films. United States: N. p., 2000.
Web.
Dinh, Long N, McLean, II, William, Balooch, Mehdi, Fehring, Jr., Edward J., & Schildbach, Marcus A. Low work function, stable thin films. United States.
Dinh, Long N, McLean, II, William, Balooch, Mehdi, Fehring, Jr., Edward J., and Schildbach, Marcus A. Sat .
"Low work function, stable thin films". United States. https://www.osti.gov/servlets/purl/873453.
@article{osti_873453,
title = {Low work function, stable thin films},
author = {Dinh, Long N and McLean, II, William and Balooch, Mehdi and Fehring, Jr., Edward J. and Schildbach, Marcus A},
abstractNote = {Generation of low work function, stable compound thin films by laser ablation. Compound thin films with low work function can be synthesized by simultaneously laser ablating silicon, for example, and thermal evaporating an alkali metal into an oxygen environment. For example, the compound thin film may be composed of Si/Cs/O. The work functions of the thin films can be varied by changing the silicon/alkali metal/oxygen ratio. Low work functions of the compound thin films deposited on silicon substrates were confirmed by ultraviolet photoelectron spectroscopy (UPS). The compound thin films are stable up to 500.degree. C. as measured by x-ray photoelectron spectroscopy (XPS). Tests have established that for certain chemical compositions and annealing temperatures of the compound thin films, negative electron affinity (NEA) was detected. The low work function, stable compound thin films can be utilized in solar cells, field emission flat panel displays, electron guns, and cold cathode electron guns.},
doi = {},
journal = {},
number = ,
volume = ,
place = {United States},
year = {Sat Jan 01 00:00:00 EST 2000},
month = {Sat Jan 01 00:00:00 EST 2000}
}