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Title: Material deposition techniques for control of solid state aperture surface properties

Patent ·
OSTI ID:1531739
; ; ; ; ;

The invention provides a method for molecular analysis. In the method, sidewalls are formed extending through a structure between two structure surfaces, to define an aperture. A layer of material is deposited on the aperture sidewalls and the two structure surfaces. The aperture with the deposited material layer is then configured in a liquid solution with a gradient in a chemical potential, between the two structure surfaces defining the aperture, that is sufficient to cause molecular translocation through the aperture.

Research Organization:
Harvard Univ., Cambridge, MA (United States)
Sponsoring Organization:
USDOE
DOE Contract Number:
FG02-01ER45922
Assignee:
President and Fellows of Harvard College (Cambridge, MA)
Patent Number(s):
8,206,568
Application Number:
11/015,349
OSTI ID:
1531739
Resource Relation:
Patent File Date: 2004-12-17
Country of Publication:
United States
Language:
English

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