Patterning by energetically-stimulated local removal of solid-condensed-gas layers and solid state chemical reactions produced with such layers
Patent
·
OSTI ID:1531567
The invention provides a method for forming a patterned material layer on a structure, by condensing a vapor to a solid condensate layer on a surface of the structure and then localized removal of selected regions of the condensate layer by directing a beam of energy at the selected regions. The structure can then be processed, with at least a portion of the patterned solid condensate layer on the structure surface, and then the solid condensate layer removed. Further there can be stimulated localized reaction between the solid condensate layer and the structure by directing a beam of energy at at least one selected region of the condensate layer.
- Research Organization:
- Harvard Univ., Cambridge, MA (United States)
- Sponsoring Organization:
- USDOE
- DOE Contract Number:
- FG02-01ER45922
- Assignee:
- President and Fellows of Harvard College (Cambridge, MA)
- Patent Number(s):
- 7,435,353
- Application Number:
- 11/008,402
- OSTI ID:
- 1531567
- Resource Relation:
- Patent File Date: 2004-12-09
- Country of Publication:
- United States
- Language:
- English
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