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Patterning by energetically-stimulated local removal of solid-condensed-gas layers and solid state chemical reactions produced with such layers

Patent ·
OSTI ID:1531567
The invention provides a method for forming a patterned material layer on a structure, by condensing a vapor to a solid condensate layer on a surface of the structure and then localized removal of selected regions of the condensate layer by directing a beam of energy at the selected regions. The structure can then be processed, with at least a portion of the patterned solid condensate layer on the structure surface, and then the solid condensate layer removed. Further there can be stimulated localized reaction between the solid condensate layer and the structure by directing a beam of energy at at least one selected region of the condensate layer.
Research Organization:
Harvard College, Cambridge, MA (United States)
Sponsoring Organization:
USDOE
DOE Contract Number:
FG02-01ER45922
Assignee:
President and Fellows of Harvard College (Cambridge, MA)
Patent Number(s):
7,435,353
Application Number:
11/008,402
OSTI ID:
1531567
Country of Publication:
United States
Language:
English

References (9)

On the mechanism of formation of amorphous condensates from the vapour phase (I). General theory journal October 1974
Sublimation of vapor-deposited water ice below 170 K, and its dependence on growth conditions journal October 1993
Nanometer Patterning with Ice journal June 2005
Amorphous Water journal June 2004
Supercooled and glassy water journal October 2003
Linear and Nonlinear Processes in the Erosion of H 2 O Ice by Fast Light Ions journal November 1980
"Sputtering" of Ice by MeV Light Ions journal April 1978
Dependence of the dissolution characteristics of As2S3 as a photoresist on the condensation rate and evaporation temperature journal May 1989
Thickness dependent crystallization kinetics of sub-micron amorphous solid water films journal March 2003