Lift-off patterning processes employing energetically-stimulated local removal of solid-condensed-gas layers

Branton, Daniel; Golovchenko, Jene A.; King, Gavin M; MoberlyChan, Warren J; Schurmann, Gregor M

Lift-off patterning processes employing energetically-stimulated local removal of solid-condensed-gas layers

Patent · Tue Jul 17 04:00:00 EDT 2012

OSTI ID:1531744

Branton, Daniel; Golovchenko, Jene A.; King, Gavin M; MoberlyChan, Warren J; Schurmann, Gregor M

The invention provides a method for forming a patterned material layer on a structure, by condensing a vapor to a solid condensate layer on a surface of the structure and then localized removal of selected regions of the condensate layer by directing an ion beam at the selected regions, exposing the structure at the selected regions. A material layer is then deposited on top of the solid condensate layer and the exposed structure at the selected regions. Then the solid condensate layer and regions of the material layer that were deposited on the solid condensate layer are removed, leaving a patterned material layer on the structure.

Research Organization:: Harvard College, Cambridge, MA (United States)

Sponsoring Organization:: USDOE

DOE Contract Number:: FG02-01ER45922

Assignee:: President and Fellows of Harvard College (Cambridge, MA)

Patent Number(s):: 8,221,595

Application Number:: 12/381,502

OSTI ID:: 1531744

Country of Publication:: United States

Language:: English

References (12)

On the mechanism of formation of amorphous condensates from the vapour phase (I). General theory Gutzov, I.; Avramov, I. Journal of Non-Crystalline Solids, Vol. 16, Issue 1 https://doi.org/10.1016/0022-3093(74)90075-1	journal	October 1974
Growth of Dielectric Thin Films by Irradiation of Condensed Molecular Precursors with Synchrotron Radiation Strongin, D. R.; Moore, J. F.; Ruckman, M. W. MRS Proceedings, Vol. 282 https://doi.org/10.1557/PROC-282-631	journal	January 1992
Sublimation of vapor-deposited water ice below 170 K, and its dependence on growth conditions Sack, N. J.; Baragiola, R. A. Physical Review B, Vol. 48, Issue 14 https://doi.org/10.1103/PhysRevB.48.9973	journal	October 1993
Nanometer Patterning with Ice King, Gavin M.; Schürmann, Gregor; Branton, Daniel Nano Letters, Vol. 5, Issue 6 https://doi.org/10.1021/nl050405n	journal	June 2005
Amorphous Water Angell, C. Austen Annual Review of Physical Chemistry, Vol. 55, Issue 1 https://doi.org/10.1146/annurev.physchem.55.091602.094156	journal	June 2004
Supercooled and glassy water Debenedetti, Pablo G. Journal of Physics: Condensed Matter, Vol. 15, Issue 45 https://doi.org/10.1088/0953-8984/15/45/R01	journal	October 2003
Nanolithography using field emission and conventional thermionic electron sources Devenish, R. W.; Eaglesham, D. J.; Maher, D. M. Ultramicroscopy, Vol. 28, Issue 1-4 https://doi.org/10.1016/0304-3991(89)90318-5	journal	April 1989
Linear and Nonlinear Processes in the Erosion of H 2 O Ice by Fast Light Ions Brown, W. L.; Augustyniak, W. M.; Lanzerotti, L. J. Physical Review Letters, Vol. 45, Issue 20 https://doi.org/10.1103/PhysRevLett.45.1632	journal	November 1980
"Sputtering" of Ice by MeV Light Ions Brown, W. L.; Lanzerotti, L. J.; Poate, J. M. Physical Review Letters, Vol. 40, Issue 15 https://doi.org/10.1103/PhysRevLett.40.1027	journal	April 1978
Dependence of the dissolution characteristics of As2S3 as a photoresist on the condensation rate and evaporation temperature Mednikarov, B. Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures, Vol. 7, Issue 3 https://doi.org/10.1116/1.584785	journal	May 1989
Thickness dependent crystallization kinetics of sub-micron amorphous solid water films Safarik, D. J.; Meyer, R. J.; Mullins, C. B. The Journal of Chemical Physics, Vol. 118, Issue 10 https://doi.org/10.1063/1.1543980	journal	March 2003
Etching of Si through a thick condensed XeF[sub 2] layer Sebel, P. G. M.; Hermans, L. J. F.; Beijerinck, H. C. W. Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films, Vol. 18, Issue 5 https://doi.org/10.1116/1.1288194	journal	January 2000

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