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Title: Patterning by energetically-stimulated local removal of solid-condensed-gas layers and solid state chemical reactions produced with such layers

Patent ·
OSTI ID:1531690

The invention provides a method for forming a patterned material layer on a structure, by condensing a vapor to a solid condensate layer on a surface of the structure and then localized removal of selected regions of the condensate layer by directing a beam of energy at the selected regions. The structure can then be processed, with at least a portion of the patterned solid condensate layer on the structure surface, and then the solid condensate layer removed. Further there can be stimulated localized reaction between the solid condensate layer and the structure by directing a beam of energy at at least one selected region of the condensate layer.

Research Organization:
Harvard Univ., Cambridge, MA (United States)
Sponsoring Organization:
USDOE
DOE Contract Number:
F-49620-01-1-0467; FG02-01ER45922
Assignee:
President and Fellows of Harvard College (Cambridge, MA)
Patent Number(s):
7,993,538
Application Number:
12/287,573
OSTI ID:
1531690
Resource Relation:
Patent File Date: 2008-10-10
Country of Publication:
United States
Language:
English

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  • Sebel, P. G. M.; Hermans, L. J. F.; Beijerinck, H. C. W.
  • Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films, Vol. 18, Issue 5 https://doi.org/10.1116/1.1288194
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