Hexagonal boron nitride: Epitaxial growth and device applications
Abstract
As a newest family member of the III-nitrides, BN is considered amongst the remaining frontiers in wide energy bandgap semiconductors with potentials for technologically significant applications in deep UV (DUV) optoelectronics, solid-state neutron detectors, electron emitters, single photon emitters, switching/memory devices, and super-capacitors. It was shown that it is possible to produce h-BN epilayers with high hexagonal phase purity, UV transparency, and film stoichiometry by employing nitrogen-rich growth conditions. The quasi-2D nature of h-BN supports unusually strong optical transitions near the band edge and a large exciton binding energy on the order of 0.7 eV. Since the isotope of B-10 has a large capture cross-section for thermal neutrons, h-BN is an ideal material for the fabrication of solid-state neutron detectors for special nuclear materials detection, well and geothermal logging, and medical imaging applications. Freestanding B-10 enriched h-BN (h-10BN) epilayers with varying thicknesses up to 200 μm have been successfully synthesized by metal organic chemical vapor deposition (MOCVD) as of this writing. By utilizing the conductivity anisotropy nature of h-BN, 1 cm2 lateral detectors fabricated from 100 μm thick h-10BN epilayers have demonstrated a detection efficiency of 59% for thermal neutrons, which is the highest on record among all solid-state neutronmore »
- Authors:
-
- Texas Tech Univ., Lubbock, TX (United States). Dept. of Electrical and Computer Engineering
- Publication Date:
- Research Org.:
- Texas Tech Univ., Lubbock, TX (United States)
- Sponsoring Org.:
- USDOE Advanced Research Projects Agency - Energy (ARPA-E); National Science Foundation (NSF); USDOE National Nuclear Security Administration (NNSA)
- OSTI Identifier:
- 1848323
- Alternate Identifier(s):
- OSTI ID: 1809473
- Grant/Contract Number:
- AR0000964; AR0001257; FG02-09ER46552; NA0002927; ECCS-1402886; DMR-1206652; 2011-DN077-ARI048
- Resource Type:
- Accepted Manuscript
- Journal Name:
- Progress in Quantum Electronics
- Additional Journal Information:
- Journal Volume: 76; Journal Issue: C; Journal ID: ISSN 0079-6727
- Publisher:
- Elsevier
- Country of Publication:
- United States
- Language:
- English
- Subject:
- 42 ENGINEERING; 71 CLASSICAL AND QUANTUM MECHANICS, GENERAL PHYSICS; Engineering; Physics; Optics
Citation Formats
Maity, A., Grenadier, S. J., Li, J., Lin, J. Y., and Jiang, H. X. Hexagonal boron nitride: Epitaxial growth and device applications. United States: N. p., 2020.
Web. doi:10.1016/j.pquantelec.2020.100302.
Maity, A., Grenadier, S. J., Li, J., Lin, J. Y., & Jiang, H. X. Hexagonal boron nitride: Epitaxial growth and device applications. United States. https://doi.org/10.1016/j.pquantelec.2020.100302
Maity, A., Grenadier, S. J., Li, J., Lin, J. Y., and Jiang, H. X. Thu .
"Hexagonal boron nitride: Epitaxial growth and device applications". United States. https://doi.org/10.1016/j.pquantelec.2020.100302. https://www.osti.gov/servlets/purl/1848323.
@article{osti_1848323,
title = {Hexagonal boron nitride: Epitaxial growth and device applications},
author = {Maity, A. and Grenadier, S. J. and Li, J. and Lin, J. Y. and Jiang, H. X.},
abstractNote = {As a newest family member of the III-nitrides, BN is considered amongst the remaining frontiers in wide energy bandgap semiconductors with potentials for technologically significant applications in deep UV (DUV) optoelectronics, solid-state neutron detectors, electron emitters, single photon emitters, switching/memory devices, and super-capacitors. It was shown that it is possible to produce h-BN epilayers with high hexagonal phase purity, UV transparency, and film stoichiometry by employing nitrogen-rich growth conditions. The quasi-2D nature of h-BN supports unusually strong optical transitions near the band edge and a large exciton binding energy on the order of 0.7 eV. Since the isotope of B-10 has a large capture cross-section for thermal neutrons, h-BN is an ideal material for the fabrication of solid-state neutron detectors for special nuclear materials detection, well and geothermal logging, and medical imaging applications. Freestanding B-10 enriched h-BN (h-10BN) epilayers with varying thicknesses up to 200 μm have been successfully synthesized by metal organic chemical vapor deposition (MOCVD) as of this writing. By utilizing the conductivity anisotropy nature of h-BN, 1 cm2 lateral detectors fabricated from 100 μm thick h-10BN epilayers have demonstrated a detection efficiency of 59% for thermal neutrons, which is the highest on record among all solid-state neutron detectors as of today. It was noted that high growth temperatures, long growth times and the use of sapphire substrate tend to incorporate oxygen related impurities into h-10BN epilayers, which strongly impacted the carrier mobility-lifetime (μτ) products and charge collection efficiencies of h-10BN neutron detectors. As the h-BN material technology further develops, improved carrier mobilities and μτ products will allow the fabrication of h-BN devices with enhanced performance.},
doi = {10.1016/j.pquantelec.2020.100302},
journal = {Progress in Quantum Electronics},
number = C,
volume = 76,
place = {United States},
year = {Thu Nov 05 00:00:00 EST 2020},
month = {Thu Nov 05 00:00:00 EST 2020}
}
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