Process for forming a porous silicon member in a crystalline silicon member
Abstract
Fabrication and use of porous silicon structures to increase surface area of heated reaction chambers, electrophoresis devices, and thermopneumatic sensor-actuators, chemical preconcentrates, and filtering or control flow devices. In particular, such high surface area or specific pore size porous silicon structures will be useful in significantly augmenting the adsorption, vaporization, desorption, condensation and flow of liquids and gasses in applications that use such processes on a miniature scale. Examples that will benefit from a high surface area, porous silicon structure include sample preconcentrators that are designed to adsorb and subsequently desorb specific chemical species from a sample background; chemical reaction chambers with enhanced surface reaction rates; and sensor-actuator chamber devices with increased pressure for thermopneumatic actuation of integrated membranes. Examples that benefit from specific pore sized porous silicon are chemical/biological filters and thermally-activated flow devices with active or adjacent surfaces such as electrodes or heaters.
- Inventors:
-
- Berkeley, CA
- Antioch, CA
- Danville, CA
- Issue Date:
- Research Org.:
- Lawrence Livermore National Laboratory (LLNL), Livermore, CA (United States)
- OSTI Identifier:
- 872769
- Patent Number(s):
- 6004450
- Assignee:
- Regents of University of California (Oakland, CA)
- Patent Classifications (CPCs):
-
B - PERFORMING OPERATIONS B01 - PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL B01D - SEPARATION
B - PERFORMING OPERATIONS B01 - PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL B01J - CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY
- DOE Contract Number:
- W-7405-ENG-48
- Resource Type:
- Patent
- Country of Publication:
- United States
- Language:
- English
- Subject:
- process; forming; porous; silicon; crystalline; fabrication; structures; increase; surface; heated; reaction; chambers; electrophoresis; devices; thermopneumatic; sensor-actuators; chemical; preconcentrates; filtering; control; flow; particular; specific; pore; size; useful; significantly; augmenting; adsorption; vaporization; desorption; condensation; liquids; gasses; applications; processes; miniature; scale; examples; benefit; structure; sample; preconcentrators; designed; adsorb; subsequently; desorb; species; background; enhanced; rates; sensor-actuator; chamber; increased; pressure; actuation; integrated; membranes; sized; biological; filters; thermally-activated; active; adjacent; surfaces; electrodes; heaters; reaction chambers; silicon structures; chamber device; specific pore; reaction rate; porous silicon; reaction chamber; chemical species; chemical reaction; pore size; crystalline silicon; chemical specie; control flow; adjacent surfaces; reaction rates; silicon structure; flow devices; surface reaction; increased pressure; enhanced surface; heated reaction; subsequently desorb; thermopneumatic sensor-actuators; increase surface; electrophoresis devices; electrophoresis device; /205/
Citation Formats
Northrup, M Allen, Yu, Conrad M, and Raley, Norman F. Process for forming a porous silicon member in a crystalline silicon member. United States: N. p., 1999.
Web.
Northrup, M Allen, Yu, Conrad M, & Raley, Norman F. Process for forming a porous silicon member in a crystalline silicon member. United States.
Northrup, M Allen, Yu, Conrad M, and Raley, Norman F. Fri .
"Process for forming a porous silicon member in a crystalline silicon member". United States. https://www.osti.gov/servlets/purl/872769.
@article{osti_872769,
title = {Process for forming a porous silicon member in a crystalline silicon member},
author = {Northrup, M Allen and Yu, Conrad M and Raley, Norman F},
abstractNote = {Fabrication and use of porous silicon structures to increase surface area of heated reaction chambers, electrophoresis devices, and thermopneumatic sensor-actuators, chemical preconcentrates, and filtering or control flow devices. In particular, such high surface area or specific pore size porous silicon structures will be useful in significantly augmenting the adsorption, vaporization, desorption, condensation and flow of liquids and gasses in applications that use such processes on a miniature scale. Examples that will benefit from a high surface area, porous silicon structure include sample preconcentrators that are designed to adsorb and subsequently desorb specific chemical species from a sample background; chemical reaction chambers with enhanced surface reaction rates; and sensor-actuator chamber devices with increased pressure for thermopneumatic actuation of integrated membranes. Examples that benefit from specific pore sized porous silicon are chemical/biological filters and thermally-activated flow devices with active or adjacent surfaces such as electrodes or heaters.},
doi = {},
journal = {},
number = ,
volume = ,
place = {United States},
year = {Fri Jan 01 00:00:00 EST 1999},
month = {Fri Jan 01 00:00:00 EST 1999}
}