Safe and low temperature thermite reaction systems and method to form porous silicon
Abstract
Embodiments of a safe, low-temperature reaction system and method for preparing porous silicon are disclosed. The porous silicon is prepared from porous silica, a low-melting metal halide, and a metal comprising aluminum, magnesium, or a combination thereof. Advantageously, embodiments of the disclosed methods can be performed at temperatures ≤400° C. Silicon produced by the disclosed methods has a porosity that is equal to or greater than the porous silica precursor. The porous silicon is suitable for use in electrodes.
- Inventors:
- Issue Date:
- Research Org.:
- Pacific Northwest National Lab. (PNNL), Richland, WA (United States)
- Sponsoring Org.:
- USDOE
- OSTI Identifier:
- 1568140
- Patent Number(s):
- 10246337
- Application Number:
- 15/436,027
- Assignee:
- Battelle Memorial Institute (Richland, WA)
- Patent Classifications (CPCs):
-
C - CHEMISTRY C01 - INORGANIC CHEMISTRY C01P - INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
C - CHEMISTRY C01 - INORGANIC CHEMISTRY C01B - NON-METALLIC ELEMENTS
- DOE Contract Number:
- AC05-76RL01830
- Resource Type:
- Patent
- Resource Relation:
- Patent File Date: 02/17/2017
- Country of Publication:
- United States
- Language:
- English
Citation Formats
Li, Xiaolin, Zhang, Ji -Guang, and Liu, Jun. Safe and low temperature thermite reaction systems and method to form porous silicon. United States: N. p., 2019.
Web.
Li, Xiaolin, Zhang, Ji -Guang, & Liu, Jun. Safe and low temperature thermite reaction systems and method to form porous silicon. United States.
Li, Xiaolin, Zhang, Ji -Guang, and Liu, Jun. Tue .
"Safe and low temperature thermite reaction systems and method to form porous silicon". United States. https://www.osti.gov/servlets/purl/1568140.
@article{osti_1568140,
title = {Safe and low temperature thermite reaction systems and method to form porous silicon},
author = {Li, Xiaolin and Zhang, Ji -Guang and Liu, Jun},
abstractNote = {Embodiments of a safe, low-temperature reaction system and method for preparing porous silicon are disclosed. The porous silicon is prepared from porous silica, a low-melting metal halide, and a metal comprising aluminum, magnesium, or a combination thereof. Advantageously, embodiments of the disclosed methods can be performed at temperatures ≤400° C. Silicon produced by the disclosed methods has a porosity that is equal to or greater than the porous silica precursor. The porous silicon is suitable for use in electrodes.},
doi = {},
journal = {},
number = ,
volume = ,
place = {United States},
year = {2019},
month = {4}
}
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Works referenced in this record:
Graphene-Coated Porous Silicon-Carbon Composite and Method of Manufacturing the Same
patent-application, February 2017
- Hwang, Eui Yong; Kim, In Young; Lee, Jin Yeong
- US Patent Application 15/307627; 20170047584