High voltage semiconductor devices and methods of making the devices
Abstract
Metal-oxide-semiconductor field-effect transistor (MOSFET) devices are described which have a p-type region between the p-type well regions of the device. The p-type region can be either floating or connected to the p-type well regions by additional p-type regions. MOSFET devices are also described which have one or more p-type regions connecting the p-type well regions of the device. The p-type well regions can be arranged in a various geometric arrangements including square, diamond and hexagonal. Methods of making the devices are also described.
- Inventors:
- Issue Date:
- Research Org.:
- Monolith Semiconductor Inc., Round Rock, TX (United States)
- Sponsoring Org.:
- USDOE
- OSTI Identifier:
- 1471407
- Patent Number(s):
- 10062749
- Application Number:
- 14/303,019
- Assignee:
- Monolith Semiconductor Inc. (Round Rock, TX)
- Patent Classifications (CPCs):
-
H - ELECTRICITY H01 - BASIC ELECTRIC ELEMENTS H01L - SEMICONDUCTOR DEVICES
- DOE Contract Number:
- AR0000442
- Resource Type:
- Patent
- Resource Relation:
- Patent File Date: 2014 Jun 12
- Country of Publication:
- United States
- Language:
- English
- Subject:
- 36 MATERIALS SCIENCE
Citation Formats
Chatty, Kiran, Matocha, Kevin, Banerjee, Sujit, and Rowland, Larry Burton. High voltage semiconductor devices and methods of making the devices. United States: N. p., 2018.
Web.
Chatty, Kiran, Matocha, Kevin, Banerjee, Sujit, & Rowland, Larry Burton. High voltage semiconductor devices and methods of making the devices. United States.
Chatty, Kiran, Matocha, Kevin, Banerjee, Sujit, and Rowland, Larry Burton. Tue .
"High voltage semiconductor devices and methods of making the devices". United States. https://www.osti.gov/servlets/purl/1471407.
@article{osti_1471407,
title = {High voltage semiconductor devices and methods of making the devices},
author = {Chatty, Kiran and Matocha, Kevin and Banerjee, Sujit and Rowland, Larry Burton},
abstractNote = {Metal-oxide-semiconductor field-effect transistor (MOSFET) devices are described which have a p-type region between the p-type well regions of the device. The p-type region can be either floating or connected to the p-type well regions by additional p-type regions. MOSFET devices are also described which have one or more p-type regions connecting the p-type well regions of the device. The p-type well regions can be arranged in a various geometric arrangements including square, diamond and hexagonal. Methods of making the devices are also described.},
doi = {},
journal = {},
number = ,
volume = ,
place = {United States},
year = {Tue Aug 28 00:00:00 EDT 2018},
month = {Tue Aug 28 00:00:00 EDT 2018}
}
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