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Comparison of metallization systems for thin film hybrid microcircuits

Technical Report ·
DOI:https://doi.org/10.2172/5031901· OSTI ID:5031901
Five metallization systems were evaluated for fabricating thin film hybrid microcircuits. The titanium/palladium/electroplated gold system proved superior in terms of thermocompression bondability, corrosion resistance, and solderability.
Research Organization:
Bendix Corp., Kansas City, MO (USA)
DOE Contract Number:
AC04-76DP00613
OSTI ID:
5031901
Report Number(s):
BDX-613-2489
Country of Publication:
United States
Language:
English