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Feasibility of electroplated gold for hybrid microcircuits. Final report

Technical Report ·
DOI:https://doi.org/10.2172/5304230· OSTI ID:5304230
Electroplated gold was investigated as a feasible alternative to vacuum evaporated gold for use as a conductive metallization layer on hybrid microcircuits (HMC) substrates. Conductor definition and resolution, RF electrical characteristics, via resistance, solder wettability, thermocompression bondability, and environmental stability of 6, 10 and 25 ..mu..m electroplated gold films were examined and compared to 6 ..mu..m evaporated gold films. No incompatibilities were found between electroplated gold and HMC requirements or fabrication processes.
Research Organization:
Bendix Corp., Kansas City, Mo. (USA)
DOE Contract Number:
EY-76-C-04-0613
OSTI ID:
5304230
Report Number(s):
BDX-613-1740
Country of Publication:
United States
Language:
English