Impurity-induced disorder in III-nitride materials and devices
Patent
·
OSTI ID:1164349
A method for impurity-induced disordering in III-nitride materials comprises growing a III-nitride heterostructure at a growth temperature and doping the heterostructure layers with a dopant during or after the growth of the heterostructure and post-growth annealing of the heterostructure. The post-growth annealing temperature can be sufficiently high to induce disorder of the heterostructure layer interfaces.
- Research Organization:
- Sandia National Laboratories (SNL-NM), Albuquerque, NM (United States)
- Sponsoring Organization:
- USDOE
- DOE Contract Number:
- AC04-94AL85000
- Assignee:
- Sandia Corporation (Albuquerque, NM)
- Patent Number(s):
- 8,895,335
- Application Number:
- 13/558,516
- OSTI ID:
- 1164349
- Country of Publication:
- United States
- Language:
- English
Similar Records
Selective layer disordering in III-nitrides with a capping layer
Methods for improved growth of group III nitride buffer layers
Methods for enhancing P-type doping in III-V semiconductor films
Patent
·
2016
·
OSTI ID:1257205
Methods for improved growth of group III nitride buffer layers
Patent
·
2014
·
OSTI ID:1143685
Methods for enhancing P-type doping in III-V semiconductor films
Patent
·
2017
·
OSTI ID:1373713