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Impurity-induced disorder in III-nitride materials and devices

Patent ·
OSTI ID:1164349
A method for impurity-induced disordering in III-nitride materials comprises growing a III-nitride heterostructure at a growth temperature and doping the heterostructure layers with a dopant during or after the growth of the heterostructure and post-growth annealing of the heterostructure. The post-growth annealing temperature can be sufficiently high to induce disorder of the heterostructure layer interfaces.
Research Organization:
Sandia National Laboratories (SNL-NM), Albuquerque, NM (United States)
Sponsoring Organization:
USDOE
DOE Contract Number:
AC04-94AL85000
Assignee:
Sandia Corporation (Albuquerque, NM)
Patent Number(s):
8,895,335
Application Number:
13/558,516
OSTI ID:
1164349
Country of Publication:
United States
Language:
English

References (14)

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Blueshift of intersubband transition wavelength in AlN/GaN multiple quantum wells by low temperature metal organic vapor phase epitaxy using pulse injection method journal October 2009
GaN/AlN-based quantum-well infrared photodetector for 1.55 μm journal July 2003
Impurity‐induced layer disordering of high gap In y (Al x Ga 1− x ) 1− y P heterostructures journal April 1988
Optical properties of undoped n-AlGaN/GaN superlattices as affected by built-in and external-electric field and by ar-implantation-induced partial disordering journal May 2002
Sub-picosecond all-optical gate utilizing aN intersubband transition journal January 2005
Impurity‐induced disordering of single well Al x Ga 1− x As‐GaAs quantum well heterostructures journal February 1984
Thermal Annealing of InGaN/GaN Strained-Layer Quantum Well journal January 1998
Indium surfactant effect on AlN∕GaN heterostructures grown by metal-organic vapor-phase epitaxy: Applications to intersubband transitions journal April 2006
Interdiffusion between GaAs and AlAs journal August 1976

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