Nanometer-scale ablation using focused, coherent extreme ultraviolet/soft x-ray light
Abstract
Ablation of holes having diameters as small as 82 nm and having clean walls was obtained in a poly(methyl methacrylate) on a silicon substrate by focusing pulses from a Ne-like Ar, 46.9 nm wavelength, capillary-discharge laser using a freestanding Fresnel zone plate diffracting into third order is described. Spectroscopic analysis of light from the ablation has also been performed. These results demonstrate the use of focused coherent EUV/SXR light for the direct nanoscale patterning of materials.
- Inventors:
-
- Fort Collins, CO
- San Diego, CA
- Encinitas, CA
- El Cerrito, CA
- Stockholm, SE
- Issue Date:
- Research Org.:
- Lawrence Berkeley National Laboratory (LBNL), Berkeley, CA (United States)
- Sponsoring Org.:
- USDOE
- OSTI Identifier:
- 1016677
- Patent Number(s):
- 7931850
- Application Number:
- US Patent Application 12/861,627
- Assignee:
- Colorado State University Research Foundation (Fort Collins, CO); The Regents of University of California (Oakland, CA); JMAR Technologies, Inc. (San Diego, CA)
- Patent Classifications (CPCs):
-
B - PERFORMING OPERATIONS B23 - MACHINE TOOLS B23K - SOLDERING OR UNSOLDERING
- DOE Contract Number:
- AC02-05CH11231
- Resource Type:
- Patent
- Country of Publication:
- United States
- Language:
- English
- Subject:
- 42 ENGINEERING
Citation Formats
Menoni, Carmen S, Rocca, Jorge J, Vaschenko, Georgiy, Bloom, Scott, Anderson, Erik H, Chao, Weilun, and Hemberg, Oscar. Nanometer-scale ablation using focused, coherent extreme ultraviolet/soft x-ray light. United States: N. p., 2011.
Web.
Menoni, Carmen S, Rocca, Jorge J, Vaschenko, Georgiy, Bloom, Scott, Anderson, Erik H, Chao, Weilun, & Hemberg, Oscar. Nanometer-scale ablation using focused, coherent extreme ultraviolet/soft x-ray light. United States.
Menoni, Carmen S, Rocca, Jorge J, Vaschenko, Georgiy, Bloom, Scott, Anderson, Erik H, Chao, Weilun, and Hemberg, Oscar. Tue .
"Nanometer-scale ablation using focused, coherent extreme ultraviolet/soft x-ray light". United States. https://www.osti.gov/servlets/purl/1016677.
@article{osti_1016677,
title = {Nanometer-scale ablation using focused, coherent extreme ultraviolet/soft x-ray light},
author = {Menoni, Carmen S and Rocca, Jorge J and Vaschenko, Georgiy and Bloom, Scott and Anderson, Erik H and Chao, Weilun and Hemberg, Oscar},
abstractNote = {Ablation of holes having diameters as small as 82 nm and having clean walls was obtained in a poly(methyl methacrylate) on a silicon substrate by focusing pulses from a Ne-like Ar, 46.9 nm wavelength, capillary-discharge laser using a freestanding Fresnel zone plate diffracting into third order is described. Spectroscopic analysis of light from the ablation has also been performed. These results demonstrate the use of focused coherent EUV/SXR light for the direct nanoscale patterning of materials.},
doi = {},
journal = {},
number = ,
volume = ,
place = {United States},
year = {Tue Apr 26 00:00:00 EDT 2011},
month = {Tue Apr 26 00:00:00 EDT 2011}
}
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