Title: Cluster beam targets for laser plasma extreme ultraviolet and soft x-ray sources

Abstract

Method and apparatus for producing extreme ultra violet (EUV) and soft x-ray radiation from an ultra-low debris plasma source are disclosed. Targets are produced by the free jet expansion of various gases through a temperature controlled nozzle to form molecular clusters. These target clusters are subsequently irradiated with commercially available lasers of moderate intensity (10.sup.11 -10.sup.12 watts/cm.sup.2) to produce a plasma radiating in the region of 0.5 to 100 nanometers. By appropriate adjustment of the experimental conditions the laser focus can be moved 10-30 mm from the nozzle thereby eliminating debris produced by plasma erosion of the nozzle.

Inventors:

Kublak, Glenn D ^[1]; Richardson, Martin C ^[2]

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+ Show Inventor Affiliations

1. 124 Turquoise Way, Livermore, Alameda County, CA 94550
2. CREOL

Issue Date:

Mon Jan 01 00:00:00 EST 1996

Research Org.:

Sandia National Laboratories (SNL), Albuquerque, NM, and Livermore, CA (United States)

OSTI Identifier:

870694

Patent Number(s):

5577092

Assignee:

Kublak, Glenn D. (124 Turquoise Way, Livermore, Alameda County, CA 94550);Richardson, Martin C. (CREOL;University Central Florida, 12424 Research Pkwy., Orlando, Orande County, FL 32826)

Patent Classifications (CPCs):

B - PERFORMING OPERATIONS B82 - NANOTECHNOLOGY B82Y - SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES

G - PHYSICS G03 - PHOTOGRAPHY G03F - PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES

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B - PERFORMING OPERATIONS B82 - NANOTECHNOLOGY B82Y - SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES

B82Y10/00 - Nanotechnology for information processing, storage or transmission, e.g. quantum computing or single electron logic

G - PHYSICS G03 - PHOTOGRAPHY G03F - PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES

G03F7/70033 - {by plasma EUV sources
G03F7/70916 - {Pollution mitigation, i.e. mitigating effect of contamination or debris, e.g. foil traps}

G - PHYSICS G21 - NUCLEAR PHYSICS G21B - FUSION REACTORS

G21B1/19 - Targets for producing thermonuclear fusion reactions, e.g. pellets for irradiation by laser or charged particle beams

H - ELECTRICITY H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR H05G - X-RAY TECHNIQUE

H05G2/003 - {being produced from a liquid or gas}
H05G2/008 - {involving a beam of energy, e.g. laser or electron beam in the process of exciting the plasma}

Y - NEW / CROSS SECTIONAL TECHNOLOGIES Y02 - TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE Y02E - REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION

Y02E30/10 - Fusion reactors

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DOE Contract Number:  

AC04-94AL85000

Resource Type:

Patent

Country of Publication:

United States

Language:

English

Subject:

cluster; beam; targets; laser; plasma; extreme; ultraviolet; soft; x-ray; sources; method; apparatus; producing; ultra; violet; euv; radiation; ultra-low; debris; source; disclosed; produced; free; jet; expansion; various; gases; temperature; controlled; nozzle; form; molecular; clusters; target; subsequently; irradiated; commercially; available; lasers; moderate; intensity; 10; 11; -10; 12; watts; cm; produce; radiating; region; 100; nanometers; appropriate; adjustment; experimental; conditions; focus; moved; 10-30; eliminating; erosion; various gases; temperature controlled; free jet; beam target; laser focus; laser plasma; temperature control; x-ray source; plasma source; extreme ultraviolet; soft x-ray; commercially available; x-ray radiation; ultra violet; ray radiation; x-ray sources; plasma extreme; available laser; /378/