Erosion resistant nozzles for laser plasma extreme ultraviolet (EUV) sources

Patent · Tue Jan 04 00:00:00 EST 2000

OSTI ID:872796

Kubiak, Glenn D ^[1]

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1. Livermore, CA

A gas nozzle having an increased resistance to erosion from energetic plasma particles generated by laser plasma sources. By reducing the area of the plasma-facing portion of the nozzle below a critical dimension and fabricating the nozzle from a material that has a high EUV transmission as well as a low sputtering coefficient such as Be, C, or Si, it has been shown that a significant reduction in reflectance loss of nearby optical components can be achieved even after exposing the nozzle to at least 10.sup.7 Xe plasma pulses.

• Research Organization: Sandia National Laboratories (SNL), Albuquerque, NM, and Livermore, CA (United States)
• DOE Contract Number: AC04 -94DP85000
• Assignee: EUV LLC (Santa Clara, CA)
• Patent Number(s): US 6011267
• Application Number: 09/032,224
• OSTI ID: 872796
• Country of Publication: United States
• Language: English

Related Subjects

erosion
resistant
nozzles
laser
plasma
extreme
ultraviolet
euv
sources
gas
nozzle
increased
resistance
energetic
particles
generated
reducing
plasma-facing
portion
below
critical
dimension
fabricating
material
transmission
sputtering
coefficient
shown
significant
reduction
reflectance
loss
nearby
optical
components
achieved
exposing
10
xe
pulses
plasma sources
laser plasma
significant reduction
optical components
plasma source
extreme ultraviolet
critical dimension
particles generated
erosion resistant
optical component
increased resistance
energetic plasma
plasma extreme
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