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Title: Methods and apparatus for use with extreme ultraviolet light having contamination protection

Patent ·
OSTI ID:1261608

An apparatus for use with extreme ultraviolet (EUV) light comprising A) a duct having a first end opening, a second end opening and an intermediate opening intermediate the first end opening the second end opening, B) an optical component disposed to receive EUV light from the second end opening or to send light through the second end opening, and C) a source of low pressure gas at a first pressure to flow through the duct, the gas having a high transmission of EUV light, fluidly coupled to the intermediate opening. In addition to or rather than gas flow the apparatus may have A) a low pressure gas with a heat control unit thermally coupled to at least one of the duct and the optical component and/or B) a voltage device to generate voltage between a first portion and a second portion of the duet with a grounded insulative portion therebetween.

Research Organization:
Sandia National Lab. (SNL-NM), Albuquerque, NM (United States)
Sponsoring Organization:
USDOE
DOE Contract Number:
AC04-94AL85000
Assignee:
Sandia Corporation (Albuquerque, NM)
Patent Number(s):
9,389,180
Application Number:
14/176,587
OSTI ID:
1261608
Resource Relation:
Patent File Date: 2014 Feb 10
Country of Publication:
United States
Language:
English

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Protection of lithographic components from particle contamination patent November 2000
Photoresist outgassing mitigation system method and apparatus for in-vacuum lithography patent April 2002
Mitigation of radiation induced surface contamination patent March 2003
Thermophoretic protection of reticles patent January 2007
Apparatus for removal of minute particles from a surface using thermophoresis to prevent particle redeposition patent November 2007
Systems and methods for measurement of a specimen with vacuum ultraviolet light patent November 2009
Method for cleaning an EUV lithography device, method for measuring the residual gas atmosphere and the contamination and EUV lithography device patent March 2011
Photoemission Monitoring of Euv Mirror and Mask Surface Contamination in Actinic EUV Systems patent-application November 2013