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Title: Cluster beam targets for laser plasma extreme ultraviolet and soft x-ray sources

Patent ·
OSTI ID:870694
 [1];  [2]
  1. 124 Turquoise Way, Livermore, Alameda County, CA 94550
  2. CREOL
+ Show Author Affiliations

Method and apparatus for producing extreme ultra violet (EUV) and soft x-ray radiation from an ultra-low debris plasma source are disclosed. Targets are produced by the free jet expansion of various gases through a temperature controlled nozzle to form molecular clusters. These target clusters are subsequently irradiated with commercially available lasers of moderate intensity (10.sup.11 -10.sup.12 watts/cm.sup.2) to produce a plasma radiating in the region of 0.5 to 100 nanometers. By appropriate adjustment of the experimental conditions the laser focus can be moved 10-30 mm from the nozzle thereby eliminating debris produced by plasma erosion of the nozzle.

Research Organization:
Sandia National Laboratories (SNL), Albuquerque, NM, and Livermore, CA (United States)
DOE Contract Number:
AC04-94AL85000
Assignee:
Kublak, Glenn D. (124 Turquoise Way, Livermore, Alameda County, CA 94550);Richardson, Martin C. (CREOL;University Central Florida, 12424 Research Pkwy., Orlando, Orande County, FL 32826)
Patent Number(s):
US 5577092
OSTI ID:
870694
Country of Publication:
United States
Language:
English

References (3)

Formation of water clusters in a free molecular jet of binary mixtures journal July 1989
Multiphoton-induced X-ray emission and amplification from clusters journal November 1993
Multiphoton induced x-ray emission from Kr clusters on M -shell (∼100 Å) and L -shell (∼6 Å) transitions journal March 1994

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laser
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soft
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method
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euv
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ultra-low
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free
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various
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nozzle
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laser focus
laser plasma
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