Reflective optical imaging systems with balanced distortion
Patent
·
OSTI ID:873706
- San Ramon, CA
Optical systems compatible with extreme ultraviolet radiation comprising four reflective elements for projecting a mask image onto a substrate are described. The four optical elements comprise, in order from object to image, convex, concave, convex and concave mirrors. The optical systems are particularly suited for step and scan lithography methods. The invention enables the use of larger slit dimensions associated with ring field scanning optics, improves wafer throughput, and allows higher semiconductor device density. The inventive optical systems are characterized by reduced dynamic distortion because the static distortion is balanced across the slit width.
- Research Organization:
- Lawrence Livermore National Laboratory (LLNL), Livermore, CA (United States)
- DOE Contract Number:
- W-7405-ENG-48
- Assignee:
- Regents of University of California (Oakland, CA)
- Patent Number(s):
- US 6226346
- OSTI ID:
- 873706
- Country of Publication:
- United States
- Language:
- English
Reflective optical designs for soft x-ray projection lithography
|
conference | December 1991 |
Design of reflective relay for soft x-ray lithography
|
conference | January 1991 |
Reflective systems design study for soft x-ray projection lithography
|
journal | November 1990 |
Optical system design issues in development of projection camera for EUV lithography
|
conference | May 1995 |
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Related Subjects
reflective
optical
imaging
systems
balanced
distortion
compatible
extreme
ultraviolet
radiation
comprising
elements
projecting
mask
image
substrate
described
comprise
convex
concave
mirrors
particularly
suited
step
scan
lithography
methods
enables
larger
slit
dimensions
associated
field
scanning
optics
improves
wafer
throughput
allows
semiconductor
device
density
inventive
characterized
reduced
dynamic
static
width
reflective elements
concave mirrors
mask image
scan lithography
lithography methods
reflective optical
optical imaging
optical systems
particularly suited
ultraviolet radiation
optical element
optical elements
extreme ultraviolet
semiconductor device
concave mirror
radiation comprising
reduced dynamic
slit width
reflective element
static distortion
slit dimensions
scanning optics
device density
wafer throughput
dimensions associated
imaging systems
improves wafer
dynamic distortion
field scanning
elements comprise
balanced distortion
/378/
optical
imaging
systems
balanced
distortion
compatible
extreme
ultraviolet
radiation
comprising
elements
projecting
mask
image
substrate
described
comprise
convex
concave
mirrors
particularly
suited
step
scan
lithography
methods
enables
larger
slit
dimensions
associated
field
scanning
optics
improves
wafer
throughput
allows
semiconductor
device
density
inventive
characterized
reduced
dynamic
static
width
reflective elements
concave mirrors
mask image
scan lithography
lithography methods
reflective optical
optical imaging
optical systems
particularly suited
ultraviolet radiation
optical element
optical elements
extreme ultraviolet
semiconductor device
concave mirror
radiation comprising
reduced dynamic
slit width
reflective element
static distortion
slit dimensions
scanning optics
device density
wafer throughput
dimensions associated
imaging systems
improves wafer
dynamic distortion
field scanning
elements comprise
balanced distortion
/378/