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Reflective optical imaging system with balanced distortion

Patent ·
OSTI ID:872615
 [1];  [2];  [3];  [2]
  1. Sunol, CA
  2. San Ramon, CA
  3. Fairfield, CT
+ Show Author Affiliations
An optical system compatible with short wavelength (extreme ultraviolet) An optical system compatible with short wavelength (extreme ultraviolet) radiation comprising four reflective elements for projecting a mask image onto a substrate. The four optical elements comprise, in order from object to image, convex, concave, convex and concave mirrors. The optical system is particularly suited for step and scan lithography methods. The invention enables the use of larger slit dimensions associated with ring field scanning optics, improves wafer throughput and allows higher semiconductor device density. The inventive optical system is characterized by reduced dynamic distortion because the static distortion is balanced across the slit width.
Research Organization:
Lawrence Livermore National Laboratory (LLNL), Livermore, CA
DOE Contract Number:
W-7405-ENG-48
Assignee:
Regents of University of California (Oakland, CA)
Patent Number(s):
US 5973826
OSTI ID:
872615
Country of Publication:
United States
Language:
English

References (3)

Optical system design issues in development of projection camera for EUV lithography conference May 1995
Design of reflective relay for soft x-ray lithography conference January 1991
Reflective systems design study for soft x-ray projection lithography journal November 1990

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