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Reflective optical imaging system

Patent ·
OSTI ID:872814
 [1]
  1. Fairfield, CT
+ Show Author Affiliations
An optical system compatible with short wavelength (extreme ultraviolet) radiation comprising four reflective elements for projecting a mask image onto a substrate. The four optical elements are characterized in order from object to image as convex, concave, convex and concave mirrors. The optical system is particularly suited for step and scan lithography methods. The invention increases the slit dimensions associated with ringfield scanning optics, improves wafer throughput and allows higher semiconductor device density.
Research Organization:
Lawrence Livermore National Laboratory (LLNL), Livermore, CA
DOE Contract Number:
W-7405-ENG-48
Assignee:
Regents of University of California (Oakland, CA)
Patent Number(s):
US 6014252
OSTI ID:
872814
Country of Publication:
United States
Language:
English

References (3)

Optical system design issues in development of projection camera for EUV lithography conference May 1995
Design of reflective relay for soft x-ray lithography conference January 1991
Reflective systems design study for soft x-ray projection lithography journal November 1990

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