Reflective optical imaging method and circuit
Patent
·
OSTI ID:873869
- Fairfield, CT
An optical system compatible with short wavelength (extreme ultraviolet) radiation comprising four reflective elements for projecting a mask image onto a substrate. The four optical elements are characterized in order from object to image as convex, concave, convex and concave mirrors. The optical system is particularly suited for step and scan lithography methods. The invention increases the slit dimensions associated with ringfield scanning optics, improves wafer throughput and allows higher semiconductor device density.
- Research Organization:
- Lawrence Livermore National Laboratory (LLNL), Livermore, CA
- DOE Contract Number:
- W-7405-ENG-48
- Assignee:
- Regents of University of California (Oakland, CA)
- Patent Number(s):
- US 6262826
- OSTI ID:
- 873869
- Country of Publication:
- United States
- Language:
- English
Design of reflective relay for soft x-ray lithography
|
conference | January 1991 |
Reflective systems design study for soft x-ray projection lithography
|
journal | November 1990 |
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