Reflective optical imaging system with balanced distortion

Patent · Tue Oct 26 04:00:00 EDT 1999

OSTI ID:20013788

Chapman, H N; Hudyma, R M; Shafer, D R; Sweeney, D W

An optical system compatible with short wavelength (extreme ultraviolet) radiation comprising four reflective elements for projecting a mask image onto a substrate is disclosed. The four optical elements comprise, in order from object to image, convex, concave, convex and concave mirrors. The optical system is particularly suited for step and scan lithography methods. The invention enables the use of larger slit dimensions associated with ring field scanning optics, improves wafer throughput and allows higher semiconductor device density. The inventive optical system is characterized by reduced dynamic distortion because the static distortion is balanced across the slit width.

• Sponsoring Organization: US Department of Energy
• DOE Contract Number: W-7405-ENG-48
• OSTI ID: 20013788
• Country of Publication: United States
• Language: English

Related Subjects

32 ENERGY CONSERVATION, CONSUMPTION, AND UTILIZATION
42 ENGINEERING
DESIGN
EXTREME ULTRAVIOLET RADIATION
MANUFACTURING
MASKING
OPTICAL SYSTEMS
SEMICONDUCTOR DEVICES