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Title: Sputter target

Patent ·
OSTI ID:863599

The disclosure relates to an improved sputter target for use in the deposition of hard coatings. An exemplary target is given wherein titanium diboride is brazed to a tantalum backing plate using a gold-palladium-nickel braze alloy.

Research Organization:
Bendix Corp., Kansas City, MO (United States)
DOE Contract Number:
EY-76-C-04-0613
Assignee:
United States of America as represented by United States (Washington, DC)
Patent Number(s):
US 4209375
OSTI ID:
863599
Country of Publication:
United States
Language:
English