Multi-part mask for implanting workpieces
A multi-part mask has a pattern plate, which includes a planar portion that has the desired aperture pattern to be used during workpiece processing. The multi-part mask also has a mounting frame, which is used to hold the pattern plate. Prior to assembly, the pattern plate has an aligning portion, which has one or more holes through which reusable alignment pins are inserted. These alignment pins enter kinematic joints disposed on the mounting frame, which serve to precisely align the pattern plate to the mounting frame. After the pattern plate has been secured to the mounting frame, the aligning portion can be detached from the pattern plate. The alignment pins can be reused at a later time. In some embodiments, the pattern plate can later be removed from the mounting frame, so that the mounting frame may be reused.
- Research Organization:
- Varian Semiconductor Equipment Associates, Inc., Gloucester, MA (United States)
- Sponsoring Organization:
- USDOE
- DOE Contract Number:
- EE0004737
- Assignee:
- Varian Semiconductor Equipment Associates, Inc. (Gloucester, MA)
- Patent Number(s):
- 9,333,733
- Application Number:
- 14/322,389
- OSTI ID:
- 1252459
- Resource Relation:
- Patent File Date: 2014 Jul 02
- Country of Publication:
- United States
- Language:
- English
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Method and apparatus for kinematic registration of a reticle
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