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Title: Mask alignment system for semiconductor processing

Abstract

A mask alignment system for providing precise and repeatable alignment between ion implantation masks and workpieces. The system includes a mask frame having a plurality of ion implantation masks loosely connected thereto. The mask frame is provided with a plurality of frame alignment cavities, and each mask is provided with a plurality of mask alignment cavities. The system further includes a platen for holding workpieces. The platen may be provided with a plurality of mask alignment pins and frame alignment pins configured to engage the mask alignment cavities and frame alignment cavities, respectively. The mask frame can be lowered onto the platen, with the frame alignment cavities moving into registration with the frame alignment pins to provide rough alignment between the masks and workpieces. The mask alignment cavities are then moved into registration with the mask alignment pins, thereby shifting each individual mask into precise alignment with a respective workpiece.

Inventors:
; ; ;
Publication Date:
Research Org.:
Varian Semiconductor Equipment Associates, Inc. Gloucester, MA (United States)
Sponsoring Org.:
USDOE
OSTI Identifier:
1343746
Patent Number(s):
9,570,309
Application Number:
14/101,974
Assignee:
Varian Semiconductor Equipment Associates, Inc. DOEEE
DOE Contract Number:  
EE0004737
Resource Type:
Patent
Resource Relation:
Patent File Date: 2013 Dec 10
Country of Publication:
United States
Language:
English
Subject:
42 ENGINEERING

Citation Formats

Webb, Aaron P., Carlson, Charles T., Weaver, William T., and Grant, Christopher N. Mask alignment system for semiconductor processing. United States: N. p., 2017. Web.
Webb, Aaron P., Carlson, Charles T., Weaver, William T., & Grant, Christopher N. Mask alignment system for semiconductor processing. United States.
Webb, Aaron P., Carlson, Charles T., Weaver, William T., and Grant, Christopher N. Tue . "Mask alignment system for semiconductor processing". United States. https://www.osti.gov/servlets/purl/1343746.
@article{osti_1343746,
title = {Mask alignment system for semiconductor processing},
author = {Webb, Aaron P. and Carlson, Charles T. and Weaver, William T. and Grant, Christopher N.},
abstractNote = {A mask alignment system for providing precise and repeatable alignment between ion implantation masks and workpieces. The system includes a mask frame having a plurality of ion implantation masks loosely connected thereto. The mask frame is provided with a plurality of frame alignment cavities, and each mask is provided with a plurality of mask alignment cavities. The system further includes a platen for holding workpieces. The platen may be provided with a plurality of mask alignment pins and frame alignment pins configured to engage the mask alignment cavities and frame alignment cavities, respectively. The mask frame can be lowered onto the platen, with the frame alignment cavities moving into registration with the frame alignment pins to provide rough alignment between the masks and workpieces. The mask alignment cavities are then moved into registration with the mask alignment pins, thereby shifting each individual mask into precise alignment with a respective workpiece.},
doi = {},
journal = {},
number = ,
volume = ,
place = {United States},
year = {2017},
month = {2}
}

Patent:

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