Investigation of Dispersion Effects in Proximity Field Nanopatterning Lithography using the Finite Difference Time Domain Method.
Conference
·
OSTI ID:1146209
Abstract not provided.
- Research Organization:
- Sandia National Lab. (SNL-NM), Albuquerque, NM (United States)
- Sponsoring Organization:
- USDOE National Nuclear Security Administration (NNSA)
- DOE Contract Number:
- AC04-94AL85000
- OSTI ID:
- 1146209
- Report Number(s):
- SAND2008-1243C; 519397
- Resource Relation:
- Conference: Proposed for presentation at the URSI General Assembly held August 7-16, 2008 in Chicago, IL.
- Country of Publication:
- United States
- Language:
- English
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