Investigation of UV, ns-laser damage resistance of hafnia films produced by electron beam evaporation and ion beam sputtering deposition methods
Abstract
Laser-induced damage in coating materials with a high index of refraction, such as hafnia, limits the performance of high power and high energy laser systems. Understanding the underlying physics responsible for laser damage holds the key for developing damage-resistant optical films. Previous studies have reported a substantial difference in laser damage onset for hafnia films produced by different deposition methods, yet the underlying mechanisms for the observed difference remain elusive. We combined laser damage testing with analytical characterizations and theoretical simulations to investigate the response of hafnia films produced by electron (e-) beam evaporation vs ion beam sputtering (IBS) methods upon UV ns-laser exposure. We found that e-beam produced hafnia films were overall more damage resistant; in addition, we observed a polarization anisotropy associated with the onset of damage in the e-beam films, while this effect was absent in the latter films. The observed differences can be attributed to the stark contrast in the pressure inside the pores inherent in both films. The high pressure inside the IBS-induced nanobubbles has been shown to reduce the threshold for laser-induced plasma breakdown leading to film damage. The polarization effects in the e-beam coatings can be related to the asymmetric electric field intensificationmore »
- Authors:
-
[1];
[1];
[1];
[2]
- Lawrence Livermore National Lab. (LLNL), Livermore, CA (United States)
- State University of New York Polytechnic Institute (SUNY Poly), Albany, NY (United States)
- Publication Date:
- Research Org.:
- Lawrence Livermore National Lab. (LLNL), Livermore, CA (United States)
- Sponsoring Org.:
- USDOE National Nuclear Security Administration (NNSA)
- OSTI Identifier:
- 1812987
- Alternate Identifier(s):
- OSTI ID: 1810420
- Report Number(s):
- LLNL-JRNL-814837
Journal ID: ISSN 0021-8979; 1023668; TRN: US2213871
- Grant/Contract Number:
- AC52-07NA27344
- Resource Type:
- Accepted Manuscript
- Journal Name:
- Journal of Applied Physics
- Additional Journal Information:
- Journal Volume: 130; Journal Issue: 4; Journal ID: ISSN 0021-8979
- Publisher:
- American Institute of Physics (AIP)
- Country of Publication:
- United States
- Language:
- English
- Subject:
- 36 MATERIALS SCIENCE
Citation Formats
Peters, V. N., Qiu, S. R., Harthcock, C., Negres, R. A., Guss, G., Voisin, T., Feigenbaum, E., Stolz, C. J., Vipin, D., and Huang, M. Investigation of UV, ns-laser damage resistance of hafnia films produced by electron beam evaporation and ion beam sputtering deposition methods. United States: N. p., 2021.
Web. doi:10.1063/5.0053219.
Peters, V. N., Qiu, S. R., Harthcock, C., Negres, R. A., Guss, G., Voisin, T., Feigenbaum, E., Stolz, C. J., Vipin, D., & Huang, M. Investigation of UV, ns-laser damage resistance of hafnia films produced by electron beam evaporation and ion beam sputtering deposition methods. United States. https://doi.org/10.1063/5.0053219
Peters, V. N., Qiu, S. R., Harthcock, C., Negres, R. A., Guss, G., Voisin, T., Feigenbaum, E., Stolz, C. J., Vipin, D., and Huang, M. Tue .
"Investigation of UV, ns-laser damage resistance of hafnia films produced by electron beam evaporation and ion beam sputtering deposition methods". United States. https://doi.org/10.1063/5.0053219. https://www.osti.gov/servlets/purl/1812987.
@article{osti_1812987,
title = {Investigation of UV, ns-laser damage resistance of hafnia films produced by electron beam evaporation and ion beam sputtering deposition methods},
author = {Peters, V. N. and Qiu, S. R. and Harthcock, C. and Negres, R. A. and Guss, G. and Voisin, T. and Feigenbaum, E. and Stolz, C. J. and Vipin, D. and Huang, M.},
abstractNote = {Laser-induced damage in coating materials with a high index of refraction, such as hafnia, limits the performance of high power and high energy laser systems. Understanding the underlying physics responsible for laser damage holds the key for developing damage-resistant optical films. Previous studies have reported a substantial difference in laser damage onset for hafnia films produced by different deposition methods, yet the underlying mechanisms for the observed difference remain elusive. We combined laser damage testing with analytical characterizations and theoretical simulations to investigate the response of hafnia films produced by electron (e-) beam evaporation vs ion beam sputtering (IBS) methods upon UV ns-laser exposure. We found that e-beam produced hafnia films were overall more damage resistant; in addition, we observed a polarization anisotropy associated with the onset of damage in the e-beam films, while this effect was absent in the latter films. The observed differences can be attributed to the stark contrast in the pressure inside the pores inherent in both films. The high pressure inside the IBS-induced nanobubbles has been shown to reduce the threshold for laser-induced plasma breakdown leading to film damage. The polarization effects in the e-beam coatings can be related to the asymmetric electric field intensification induced by the columnar void structure. Our findings provide a fundamental basis for developing strategies to produce laser damage-resistant coatings for UV pulsed laser applications.},
doi = {10.1063/5.0053219},
journal = {Journal of Applied Physics},
number = 4,
volume = 130,
place = {United States},
year = {Tue Jul 27 00:00:00 EDT 2021},
month = {Tue Jul 27 00:00:00 EDT 2021}
}
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