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Title: Origin and effect of film sub-stoichiometry on ultraviolet, ns-laser damage resistance of hafnia single layers

Authors:
; ; ; ORCiD logo; ; ; ;
Publication Date:
Research Org.:
Lawrence Livermore National Lab. (LLNL), Livermore, CA (United States)
Sponsoring Org.:
USDOE National Nuclear Security Administration (NNSA)
OSTI Identifier:
1604518
Alternate Identifier(s):
OSTI ID: 1605530
Report Number(s):
[LLNL-JRNL-790581]
[Journal ID: ISSN 2159-3930]
Grant/Contract Number:  
[17-SI-001; AC52-07NA27344]
Resource Type:
Published Article
Journal Name:
Optical Materials Express
Additional Journal Information:
[Journal Name: Optical Materials Express Journal Volume: 10 Journal Issue: 4]; Journal ID: ISSN 2159-3930
Publisher:
Optical Society of America
Country of Publication:
United States
Language:
English
Subject:
Lasers

Citation Formats

Harthcock, Colin, Qiu, S. Roger, Mirkarimi, Paul B., Negres, Raluca A., Guss, Gabe, Menor, Marlon G., Bhowmik, Gourav, and Huang, Mengbing. Origin and effect of film sub-stoichiometry on ultraviolet, ns-laser damage resistance of hafnia single layers. United States: N. p., 2020. Web. doi:10.1364/OME.389416.
Harthcock, Colin, Qiu, S. Roger, Mirkarimi, Paul B., Negres, Raluca A., Guss, Gabe, Menor, Marlon G., Bhowmik, Gourav, & Huang, Mengbing. Origin and effect of film sub-stoichiometry on ultraviolet, ns-laser damage resistance of hafnia single layers. United States. doi:10.1364/OME.389416.
Harthcock, Colin, Qiu, S. Roger, Mirkarimi, Paul B., Negres, Raluca A., Guss, Gabe, Menor, Marlon G., Bhowmik, Gourav, and Huang, Mengbing. Fri . "Origin and effect of film sub-stoichiometry on ultraviolet, ns-laser damage resistance of hafnia single layers". United States. doi:10.1364/OME.389416.
@article{osti_1604518,
title = {Origin and effect of film sub-stoichiometry on ultraviolet, ns-laser damage resistance of hafnia single layers},
author = {Harthcock, Colin and Qiu, S. Roger and Mirkarimi, Paul B. and Negres, Raluca A. and Guss, Gabe and Menor, Marlon G. and Bhowmik, Gourav and Huang, Mengbing},
abstractNote = {},
doi = {10.1364/OME.389416},
journal = {Optical Materials Express},
number = [4],
volume = [10],
place = {United States},
year = {2020},
month = {3}
}

Journal Article:
Free Publicly Available Full Text
Publisher's Version of Record
DOI: 10.1364/OME.389416

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