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Title: Stitching interferometry for synchrotron mirror metrology at National Synchrotron Light Source II (NSLS-II)

Abstract

With the fast development of diffraction-limited storage rings and free electron lasers, the requirement for ultimate quality X-ray mirror is getting higher and the mirror surface needs to approach the sub-nm root mean square height specifications. Here, these ultimate specifications challenge the X-ray mirror metrology community. In this work, we present our developed dedicated stitching metrology platform for X-ray mirror metrology. Various stitching methods with different stitching parameters are investigated in our stitching interferometric system. Some experimental results are given to demonstrate its validity and performance. According to the measurement results, the repeatability of measuring a flat mirror in the software stitching mode is at 0.1 nm RMS level. In relative angle determinable stitching mode when measuring a curved mirror with its radius of curvature varying from 50 m to 175 m, the repeatability is around 1 nm RMS.

Authors:
 [1];  [1];  [1];  [1];  [1];  [1];  [1];  [1]
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  1. Brookhaven National Lab. (BNL), Upton, NY (United States)
Publication Date:
Research Org.:
Brookhaven National Lab. (BNL), Upton, NY (United States)
Sponsoring Org.:
USDOE Office of Science (SC), Basic Energy Sciences (BES). Scientific User Facilities Division
OSTI Identifier:
1583106
Alternate Identifier(s):
OSTI ID: 1566248
Report Number(s):
BNL-213522-2020-JAAM
Journal ID: ISSN 0143-8166; TRN: US2100898
Grant/Contract Number:  
SC0012704
Resource Type:
Accepted Manuscript
Journal Name:
Optics and Lasers in Engineering
Additional Journal Information:
Journal Volume: 124; Journal Issue: C; Journal ID: ISSN 0143-8166
Publisher:
Elsevier
Country of Publication:
United States
Language:
English
Subject:
42 ENGINEERING; Optical metrology; X-ray mirror metrology; Synchrotron mirror inspection; Stitching interferometry

Citation Formats

Huang, Lei, Wang, Tianyi, Tayabaly, Kashmira, Kuhne, Dennis, Xu, Weihe, Xu, Wei, Vescovi, Matthew, and Idir, Mourad. Stitching interferometry for synchrotron mirror metrology at National Synchrotron Light Source II (NSLS-II). United States: N. p., 2019. Web. doi:10.1016/j.optlaseng.2019.105795.
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Huang, Lei, Wang, Tianyi, Tayabaly, Kashmira, Kuhne, Dennis, Xu, Weihe, Xu, Wei, Vescovi, Matthew, & Idir, Mourad. Stitching interferometry for synchrotron mirror metrology at National Synchrotron Light Source II (NSLS-II). United States. https://doi.org/10.1016/j.optlaseng.2019.105795
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Huang, Lei, Wang, Tianyi, Tayabaly, Kashmira, Kuhne, Dennis, Xu, Weihe, Xu, Wei, Vescovi, Matthew, and Idir, Mourad. Tue . "Stitching interferometry for synchrotron mirror metrology at National Synchrotron Light Source II (NSLS-II)". United States. https://doi.org/10.1016/j.optlaseng.2019.105795. https://www.osti.gov/servlets/purl/1583106.
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@article{osti_1583106,
title = {Stitching interferometry for synchrotron mirror metrology at National Synchrotron Light Source II (NSLS-II)},
author = {Huang, Lei and Wang, Tianyi and Tayabaly, Kashmira and Kuhne, Dennis and Xu, Weihe and Xu, Wei and Vescovi, Matthew and Idir, Mourad},
abstractNote = {With the fast development of diffraction-limited storage rings and free electron lasers, the requirement for ultimate quality X-ray mirror is getting higher and the mirror surface needs to approach the sub-nm root mean square height specifications. Here, these ultimate specifications challenge the X-ray mirror metrology community. In this work, we present our developed dedicated stitching metrology platform for X-ray mirror metrology. Various stitching methods with different stitching parameters are investigated in our stitching interferometric system. Some experimental results are given to demonstrate its validity and performance. According to the measurement results, the repeatability of measuring a flat mirror in the software stitching mode is at 0.1 nm RMS level. In relative angle determinable stitching mode when measuring a curved mirror with its radius of curvature varying from 50 m to 175 m, the repeatability is around 1 nm RMS.},
doi = {10.1016/j.optlaseng.2019.105795},
journal = {Optics and Lasers in Engineering},
number = C,
volume = 124,
place = {United States},
year = {Tue Jul 30 00:00:00 EDT 2019},
month = {Tue Jul 30 00:00:00 EDT 2019}
}
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Journal Article:
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Publisher's Version of Record
https://doi.org/10.1016/j.optlaseng.2019.105795
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Cited by: 16 works
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Figures / Tables:

Fig. 1 Fig. 1: The essential purpose of stitching is to determine the geometric relation for the subset data. For instance, the geometric parameters an , bn and cn for the nth subset.
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Works referenced in this record:

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    Figures / Tables found in this record:

    Fig. 1 (p. 4)figure
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    Fig. 3 (p. 5)figure
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    Fig. 9 (p. 9)figure
    Fig. 12 (p. 10)figure
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