Review of the 1st EUV Light Sources Code Comparison Workshop

Sheil, John; Versolato, Oscar; Bakshi, Vivek; Scott, Howard

doi:10.3390/atoms11100130

Title: Review of the 1st EUV Light Sources Code Comparison Workshop

Journal Article · 12 October 2023 · Atoms

DOI: https://doi.org/10.3390/atoms11100130 · OSTI ID:2280475

^[1]; Versolato, Oscar ^[2]; Bakshi, Vivek ^[3]; Scott, Howard ^[4]

Advanced Research Center for Nanolithography, Amsterdam (Netherlands)
Advanced Research Center for Nanolithography, Amsterdam (Netherlands); Vrije Universiteit, Amsterdam (Netherlands)
EUV Litho, Inc., Austin, TX (United States)
Lawrence Livermore National Laboratory (LLNL), Livermore, CA (United States)

We review the results of the 1^stExtreme Ultraviolet (EUV) Light Sources Code Comparison Workshop. The goal of this workshop was to provide a platform for specialists in EUV light source plasma modeling to benchmark and validate their numerical codes using well-defined case studies. Detailed consideration of a plethora of atomic collisional and radiative processes is required for modeling EUV light source plasmas. Eight institutions spanning four countries contributed data to the workshop. Two topics were addressed, namely (i) the atomic kinetics and radiative properties of tin plasmas under EUV-generating conditions and (ii) laser absorption in a fully ionized, one-dimensional hydrogen plasma. In this paper, we summarize the key findings of the workshop and outline plans for future iterations of the code comparison activity.

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Research Organization:: Lawrence Livermore National Laboratory (LLNL), Livermore, CA (United States)

Sponsoring Organization:: USDOE National Nuclear Security Administration (NNSA)

Grant/Contract Number:: AC52-07NA27344

OSTI ID:: 2280475

Report Number(s):: LLNL--JRNL-858959; 1089039

Journal Information:: Atoms, Journal Name: Atoms Journal Issue: 10 Vol. 11; ISSN 2218-2004

Publisher:: MDPICopyright Statement

Country of Publication:: United States

Language:: English

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