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Title: Plasma and Radiation Modelling of EUV Sources for Micro Lithography

Abstract

Future extreme ultraviolet (EUV) lithography will require very high radiation intensities in a narrow wavelength range around 13.5 nm, which is most efficiently emitted as line radiation by highly ionized heavy particles. Currently the most intense EUV sources are based on Xenon or Tin discharges. After having investigated the limits of a hollow cathode triggered Xenon pinch discharge a Laser triggered Tin vacuum spark discharge is favored by Philips Extreme UV.Plasma and radiation properties of these highly transient discharges will be compared. Besides simple MHD-models the ADAS software package has been used to generate important atomic and spectral data of the relevant ion stages. To compute excitation and radiation properties, collisional radiative equilibria of individual ion stages are computed. For many lines opacity effects cannot be neglected. The optical depths, however, allow for a treatment based on escape factors. Due to the rapid change of plasma parameters the abundances of the different ionization stages must be computed dynamically. This requires effective ionization and recombination rates, which can also be supplied by ADAS.

Authors:
 [1]
  1. Philips Research Laboratories, Weisshausstr. 2, Aachen (Germany)
Publication Date:
OSTI Identifier:
21056921
Resource Type:
Journal Article
Resource Relation:
Journal Name: AIP Conference Proceedings; Journal Volume: 901; Journal Issue: 1; Conference: ICAMDATA: 5. international conference on atomic and molecular data and their applications, Meudon (France), 15-19 Oct 2006; Other Information: DOI: 10.1063/1.2727368; (c) 2007 American Institute of Physics; Country of input: International Atomic Energy Agency (IAEA)
Country of Publication:
United States
Language:
English
Subject:
70 PLASMA PHYSICS AND FUSION TECHNOLOGY; A CODES; ELECTRIC SPARKS; ELECTRON COLLISIONS; EQUILIBRIUM; EXCITATION; EXTREME ULTRAVIOLET RADIATION; HOLLOW CATHODES; ION COLLISIONS; IONIZATION; LASERS; LIGHT TRANSMISSION; MAGNETOHYDRODYNAMICS; OPACITY; PHOTON EMISSION; PLASMA; PLASMA SIMULATION; RECOMBINATION; TIN; XENON

Citation Formats

Kruecken, Thomas. Plasma and Radiation Modelling of EUV Sources for Micro Lithography. United States: N. p., 2007. Web. doi:10.1063/1.2727368.
Kruecken, Thomas. Plasma and Radiation Modelling of EUV Sources for Micro Lithography. United States. doi:10.1063/1.2727368.
Kruecken, Thomas. Fri . "Plasma and Radiation Modelling of EUV Sources for Micro Lithography". United States. doi:10.1063/1.2727368.
@article{osti_21056921,
title = {Plasma and Radiation Modelling of EUV Sources for Micro Lithography},
author = {Kruecken, Thomas},
abstractNote = {Future extreme ultraviolet (EUV) lithography will require very high radiation intensities in a narrow wavelength range around 13.5 nm, which is most efficiently emitted as line radiation by highly ionized heavy particles. Currently the most intense EUV sources are based on Xenon or Tin discharges. After having investigated the limits of a hollow cathode triggered Xenon pinch discharge a Laser triggered Tin vacuum spark discharge is favored by Philips Extreme UV.Plasma and radiation properties of these highly transient discharges will be compared. Besides simple MHD-models the ADAS software package has been used to generate important atomic and spectral data of the relevant ion stages. To compute excitation and radiation properties, collisional radiative equilibria of individual ion stages are computed. For many lines opacity effects cannot be neglected. The optical depths, however, allow for a treatment based on escape factors. Due to the rapid change of plasma parameters the abundances of the different ionization stages must be computed dynamically. This requires effective ionization and recombination rates, which can also be supplied by ADAS.},
doi = {10.1063/1.2727368},
journal = {AIP Conference Proceedings},
number = 1,
volume = 901,
place = {United States},
year = {Fri Apr 06 00:00:00 EDT 2007},
month = {Fri Apr 06 00:00:00 EDT 2007}
}