# Heights integrated model as instrument for simulation of hydrodynamic, radiation transport, and heat conduction phenomena of laser-produced plasma in EUV applications.

## Abstract

The HEIGHTS integrated model has been developed as an instrument for simulation and optimization of laser-produced plasma (LPP) sources relevant to extreme ultraviolet (EUV) lithography. The model combines three general parts: hydrodynamics, radiation transport, and heat conduction. The first part employs a total variation diminishing scheme in the Lax-Friedrich formulation (TVD-LF); the second part, a Monte Carlo model; and the third part, implicit schemes with sparse matrix technology. All model parts consider physical processes in three-dimensional geometry. The influence of a generated magnetic field on laser plasma behavior was estimated, and it was found that this effect could be neglected for laser intensities relevant to EUV (up to {approx}10{sup 12} W/cm{sup 2}). All applied schemes were tested on analytical problems separately. Benchmark modeling of the full EUV source problem with a planar tin target showed good correspondence with experimental and theoretical data. Preliminary results are presented for tin droplet- and planar-target LPP devices. The influence of three-dimensional effects on EUV properties of source is discussed.

- Authors:

- Publication Date:

- Research Org.:
- Argonne National Lab. (ANL), Argonne, IL (United States)

- Sponsoring Org.:
- USDOE Office of Science (SC); Intel Corp.

- OSTI Identifier:
- 932939

- Report Number(s):
- ANL-MCS-CPH-06/56

TRN: US200814%%681

- DOE Contract Number:
- DE-AC02-06CH11357

- Resource Type:
- Technical Report

- Country of Publication:
- United States

- Language:
- ENGLISH

- Subject:
- 97 MATHEMATICS AND COMPUTING; 42 ENGINEERING; H CODES; HYDRODYNAMICS; LASER-PRODUCED PLASMA; RADIATION TRANSPORT; COMPUTERIZED SIMULATION; HEAT TRANSFER; EXTREME ULTRAVIOLET RADIATION; INTEGRATED CIRCUITS; FABRICATION

### Citation Formats

```
Sizyuk, V, Hassanein, A, Morozov, V, Sizyuk, T, and Mathematics and Computer Science.
```*Heights integrated model as instrument for simulation of hydrodynamic, radiation transport, and heat conduction phenomena of laser-produced plasma in EUV applications.*. United States: N. p., 2007.
Web. doi:10.2172/932939.

```
Sizyuk, V, Hassanein, A, Morozov, V, Sizyuk, T, & Mathematics and Computer Science.
```*Heights integrated model as instrument for simulation of hydrodynamic, radiation transport, and heat conduction phenomena of laser-produced plasma in EUV applications.*. United States. doi:10.2172/932939.

```
Sizyuk, V, Hassanein, A, Morozov, V, Sizyuk, T, and Mathematics and Computer Science. Tue .
"Heights integrated model as instrument for simulation of hydrodynamic, radiation transport, and heat conduction phenomena of laser-produced plasma in EUV applications.". United States.
doi:10.2172/932939. https://www.osti.gov/servlets/purl/932939.
```

```
@article{osti_932939,
```

title = {Heights integrated model as instrument for simulation of hydrodynamic, radiation transport, and heat conduction phenomena of laser-produced plasma in EUV applications.},

author = {Sizyuk, V and Hassanein, A and Morozov, V and Sizyuk, T and Mathematics and Computer Science},

abstractNote = {The HEIGHTS integrated model has been developed as an instrument for simulation and optimization of laser-produced plasma (LPP) sources relevant to extreme ultraviolet (EUV) lithography. The model combines three general parts: hydrodynamics, radiation transport, and heat conduction. The first part employs a total variation diminishing scheme in the Lax-Friedrich formulation (TVD-LF); the second part, a Monte Carlo model; and the third part, implicit schemes with sparse matrix technology. All model parts consider physical processes in three-dimensional geometry. The influence of a generated magnetic field on laser plasma behavior was estimated, and it was found that this effect could be neglected for laser intensities relevant to EUV (up to {approx}10{sup 12} W/cm{sup 2}). All applied schemes were tested on analytical problems separately. Benchmark modeling of the full EUV source problem with a planar tin target showed good correspondence with experimental and theoretical data. Preliminary results are presented for tin droplet- and planar-target LPP devices. The influence of three-dimensional effects on EUV properties of source is discussed.},

doi = {10.2172/932939},

journal = {},

number = ,

volume = ,

place = {United States},

year = {Tue Jan 16 00:00:00 EST 2007},

month = {Tue Jan 16 00:00:00 EST 2007}

}