Large Aperture and Wedged Multilayer Laue Lens for X-ray Nanofocusing

Bouet, Nathalie; Macrander, Albert T.; Maser, Jörg; Chu, Yong S.; Zhou, Juan; Nazaretski, Evgeny; Yan, Hanfei; Huang, Xiaojing; Conley, Ray

doi:10.1166/jnn.2019.16479

Title: Large Aperture and Wedged Multilayer Laue Lens for X-ray Nanofocusing

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Abstract

Diffraction optics fabricated from multilayers offer an intriguing alternative to lithography-based zone plates due to their advantages of virtually limitless aspect ratio and extremely small feature size. However, other issues, intrinsic to thin-film deposition, such as film stress and deposition rate instability, for example, limit the total achievable aperture. Over the last decade, Multilayer Laue Lens (MLLs) have progressed from a mere curiosity with initial aperture sizes in the 3-10 μm range, to real beamline-deployed optics with apertures in the 40-50 μm range1-3. By optimizing deposition conditions and incorporating new materials, MLLs have now broken the 100 μm thickness milestone. A flat WSi2/Al-Si MLL with a deposition thickness of 102 μm, the largest MLL to date, is reviewed. New large aperture wedged MLLs (wMLL), which were first fabricated by APS in 2006 using the WSi2/Si material system, are presented which demonstrate high focusing efficiency across a broad energy range. These results confirm findings by other groups who have also independently fabricated wMLL4, 5 based on a similar material system.

Authors:

Bouet, Nathalie ^[1]; Macrander, Albert T. ^[2]; Maser, Jörg ^[2]; Chu, Yong S. ^[1]; Zhou, Juan ^[1]; Nazaretski, Evgeny ^[1]; Yan, Hanfei ^[1]; Huang, Xiaojing ^[1]; Conley, Ray ^[1]

Brookhaven National Lab. (BNL), Upton, NY (United States)
Argonne National Lab. (ANL), Argonne, IL (United States)

Publication Date:: Tue Jan 01 00:00:00 EST 2019

Research Org.:: Brookhaven National Lab. (BNL), Upton, NY (United States); Argonne National Lab. (ANL), Argonne, IL (United States)

Sponsoring Org.:: USDOE Office of Science (SC), Basic Energy Sciences (BES)

OSTI Identifier:: 1482362

Alternate Identifier(s):: OSTI ID: 1491808

Report Number(s):: BNL-209449-2018-JAAM
Journal ID: ISSN 1533-4880

Grant/Contract Number:: SC0012704; AC02-06CH11357

Resource Type:: Accepted Manuscript

Journal Name:: Journal of Nanoscience and Nanotechnology

Additional Journal Information:: Journal Volume: 19; Journal Issue: 1; Journal ID: ISSN 1533-4880

Publisher:: American Scientific Publishers

Country of Publication:: United States

Language:: English

Subject:: 47 OTHER INSTRUMENTATION; Al–Si; MLL; Multilayer; Multilayer Laue Lens; Nanofocusing; WSi2/Si; X-ray Optics; Multilayer, x-ray optics, Multilayer Laue Lens, MLL, Nanofocusing, WSi2/Si, Al-Si

Citation Formats


                    Bouet, Nathalie, Macrander, Albert T., Maser, Jörg, Chu, Yong S., Zhou, Juan, Nazaretski, Evgeny, Yan, Hanfei, Huang, Xiaojing, and Conley, Ray. Large Aperture and Wedged Multilayer Laue Lens for X-ray Nanofocusing.  United States: N. p., 2019. 
Web.  doi:10.1166/jnn.2019.16479.

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                    Bouet, Nathalie, Macrander, Albert T., Maser, Jörg, Chu, Yong S., Zhou, Juan, Nazaretski, Evgeny, Yan, Hanfei, Huang, Xiaojing, & Conley, Ray. Large Aperture and Wedged Multilayer Laue Lens for X-ray Nanofocusing.  United States.  https://doi.org/10.1166/jnn.2019.16479

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                    Bouet, Nathalie, Macrander, Albert T., Maser, Jörg, Chu, Yong S., Zhou, Juan, Nazaretski, Evgeny, Yan, Hanfei, Huang, Xiaojing, and Conley, Ray. Tue .  
"Large Aperture and Wedged Multilayer Laue Lens for X-ray Nanofocusing".  United States.  https://doi.org/10.1166/jnn.2019.16479.  https://www.osti.gov/servlets/purl/1482362.

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@article{osti_1482362,

  title        = {Large Aperture and Wedged Multilayer Laue Lens for X-ray Nanofocusing},

  author       = {Bouet, Nathalie and Macrander, Albert T. and Maser, Jörg and Chu, Yong S. and Zhou, Juan and Nazaretski, Evgeny and Yan, Hanfei and Huang, Xiaojing and Conley, Ray},

  abstractNote = {Diffraction optics fabricated from multilayers offer an intriguing alternative to lithography-based zone plates due to their advantages of virtually limitless aspect ratio and extremely small feature size. However, other issues, intrinsic to thin-film deposition, such as film stress and deposition rate instability, for example, limit the total achievable aperture. Over the last decade, Multilayer Laue Lens (MLLs) have progressed from a mere curiosity with initial aperture sizes in the 3-10 μm range, to real beamline-deployed optics with apertures in the 40-50 μm range1-3. By optimizing deposition conditions and incorporating new materials, MLLs have now broken the 100 μm thickness milestone. A flat WSi2/Al-Si MLL with a deposition thickness of 102 μm, the largest MLL to date, is reviewed. New large aperture wedged MLLs (wMLL), which were first fabricated by APS in 2006 using the WSi2/Si material system, are presented which demonstrate high focusing efficiency across a broad energy range. These results confirm findings by other groups who have also independently fabricated wMLL4, 5 based on a similar material system.},

  doi          = {10.1166/jnn.2019.16479},

  journal      = {Journal of Nanoscience and Nanotechnology},

  number       = 1,

  volume       = 19,

  place        = {United States},

  year         = {Tue Jan 01 00:00:00 EST 2019},

  month        = {Tue Jan 01 00:00:00 EST 2019}

}

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