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Title: Achieving hard X-ray nanofocusing using a wedged multilayer Laue lens

Abstract

We report the fabrication and the characterization of a wedged multilayer Laue lens for x-ray nanofocusing. The lens was fabricated using sputtering deposition technique, and a specially designed mask was employed to introduce a thickness gradient in the lateral direction of the multilayer. X-ray characterization showed an efficiency of 27% and a focus size of 24 nm at 14.6 keV, in a good agreement with theoretical calculations. These results indicate that the desired wedging was achieved in the fabricated wedged MLL. We anticipate that continuous development on wedged MLL will advance x-ray nanofocusing optics to new frontiers, and enriches capabilities and opportunities for hard X-ray microscopy.

Authors:
; ; ; ; ; ; ; ; ; ; ; ;
Publication Date:
Research Org.:
Argonne National Lab. (ANL), Argonne, IL (United States)
Sponsoring Org.:
USDOE Office of Science (SC), Basic Energy Sciences (BES) (SC-22)
OSTI Identifier:
1391867
DOE Contract Number:  
AC02-06CH11357
Resource Type:
Journal Article
Journal Name:
Optics Express
Additional Journal Information:
Journal Volume: 23; Journal Issue: 10; Journal ID: ISSN 1094-4087
Publisher:
Optical Society of America (OSA)
Country of Publication:
United States
Language:
English

Citation Formats

Huang, Xiaojing, Conley, Raymond, Bouet, Nathalie, Zhou, Juan, Macrander, Albert, Maser, Jorg, Yan, Hanfei, Nazaretski, Evgeny, Lauer, Kenneth, Harder, Ross, Robinson, Ian K., Kalbfleisch, Sebastian, and Chu, Yong S. Achieving hard X-ray nanofocusing using a wedged multilayer Laue lens. United States: N. p., 2015. Web. doi:10.1364/OE.23.012496.
Huang, Xiaojing, Conley, Raymond, Bouet, Nathalie, Zhou, Juan, Macrander, Albert, Maser, Jorg, Yan, Hanfei, Nazaretski, Evgeny, Lauer, Kenneth, Harder, Ross, Robinson, Ian K., Kalbfleisch, Sebastian, & Chu, Yong S. Achieving hard X-ray nanofocusing using a wedged multilayer Laue lens. United States. doi:10.1364/OE.23.012496.
Huang, Xiaojing, Conley, Raymond, Bouet, Nathalie, Zhou, Juan, Macrander, Albert, Maser, Jorg, Yan, Hanfei, Nazaretski, Evgeny, Lauer, Kenneth, Harder, Ross, Robinson, Ian K., Kalbfleisch, Sebastian, and Chu, Yong S. Thu . "Achieving hard X-ray nanofocusing using a wedged multilayer Laue lens". United States. doi:10.1364/OE.23.012496.
@article{osti_1391867,
title = {Achieving hard X-ray nanofocusing using a wedged multilayer Laue lens},
author = {Huang, Xiaojing and Conley, Raymond and Bouet, Nathalie and Zhou, Juan and Macrander, Albert and Maser, Jorg and Yan, Hanfei and Nazaretski, Evgeny and Lauer, Kenneth and Harder, Ross and Robinson, Ian K. and Kalbfleisch, Sebastian and Chu, Yong S.},
abstractNote = {We report the fabrication and the characterization of a wedged multilayer Laue lens for x-ray nanofocusing. The lens was fabricated using sputtering deposition technique, and a specially designed mask was employed to introduce a thickness gradient in the lateral direction of the multilayer. X-ray characterization showed an efficiency of 27% and a focus size of 24 nm at 14.6 keV, in a good agreement with theoretical calculations. These results indicate that the desired wedging was achieved in the fabricated wedged MLL. We anticipate that continuous development on wedged MLL will advance x-ray nanofocusing optics to new frontiers, and enriches capabilities and opportunities for hard X-ray microscopy.},
doi = {10.1364/OE.23.012496},
journal = {Optics Express},
issn = {1094-4087},
number = 10,
volume = 23,
place = {United States},
year = {2015},
month = {1}
}

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    Works referencing / citing this record:

    Multilayer Laue lenses at high X-ray energies: performance and applications
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