Achieving hard X-ray nanofocusing using a wedged multilayer Laue lens
We report the fabrication and the characterization of a wedged multilayer Laue lens for x-ray nanofocusing. The lens was fabricated using sputtering deposition technique, and a specially designed mask was employed to introduce a thickness gradient in the lateral direction of the multilayer. X-ray characterization showed an efficiency of 27% and a focus size of 24 nm at 14.6 keV, in a good agreement with theoretical calculations. These results indicate that the desired wedging was achieved in the fabricated wedged MLL. We anticipate that continuous development on wedged MLL will advance x-ray nanofocusing optics to new frontiers, and enriches capabilities and opportunities for hard X-ray microscopy.
- Research Organization:
- Argonne National Lab. (ANL), Argonne, IL (United States)
- Sponsoring Organization:
- USDOE Office of Science (SC), Basic Energy Sciences (BES)
- DOE Contract Number:
- AC02-06CH11357
- OSTI ID:
- 1391867
- Journal Information:
- Optics Express, Vol. 23, Issue 10; ISSN 1094-4087
- Publisher:
- Optical Society of America (OSA)
- Country of Publication:
- United States
- Language:
- English
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