Extreme-UV scanning wafer and reticle stages
Abstract
A stage for precise positioning of a chuck in three orthogonal linear axes and in three orthogonal rotation axes that includes first and second subassemblies. The a first subassembly includes (i) a monolithic mirror that supports the chuck wherein the monolithic mirror has at least two polished orthogonal faces for interferometric determination of the X, Y, and .THETA.z positions; (ii) a plurality of electromagnetic actuators that control fine positioning in all six axes and coarse positioning in one axis; (iii) a position sensor for measuring the vertical Z position of the monolithic mirror; and (iv) a Lorentz actuator, that includes magnet array, for effecting motion in the Y axis. The a second subassembly comprising a stepping axis beam over which the first subassembly is suspended, wherein the stepping axis beam includes a drive coil array for the Lorentz actuator. T the stage can also include a cable stage subassembly that is positioned a fixed distance away from the monolithic mirror and/or a mechanical zero reference for the first subassembly.
- Inventors:
-
- Windham, NH
- Issue Date:
- Research Org.:
- Sandia National Laboratories (SNL), Albuquerque, NM, and Livermore, CA (United States)
- OSTI Identifier:
- 874267
- Patent Number(s):
- 6353271
- Assignee:
- EUV, LLC (Santa Clara, CA)
- Patent Classifications (CPCs):
-
G - PHYSICS G03 - PHOTOGRAPHY G03F - PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES
- DOE Contract Number:
- AC04-94AL85000
- Resource Type:
- Patent
- Country of Publication:
- United States
- Language:
- English
- Subject:
- extreme-uv; scanning; wafer; reticle; stages; stage; precise; positioning; chuck; orthogonal; linear; axes; rotation; subassemblies; subassembly; monolithic; mirror; supports; polished; interferometric; determination; thetaz; positions; ii; plurality; electromagnetic; actuators; control; fine; six; coarse; axis; iii; position; sensor; measuring; vertical; z; lorentz; actuator; magnet; array; effecting; motion; comprising; stepping; beam; suspended; drive; coil; cable; positioned; fixed; distance; andor; mechanical; zero; reference; drive coil; /310/
Citation Formats
Williams, Mark E. Extreme-UV scanning wafer and reticle stages. United States: N. p., 2002.
Web.
Williams, Mark E. Extreme-UV scanning wafer and reticle stages. United States.
Williams, Mark E. Tue .
"Extreme-UV scanning wafer and reticle stages". United States. https://www.osti.gov/servlets/purl/874267.
@article{osti_874267,
title = {Extreme-UV scanning wafer and reticle stages},
author = {Williams, Mark E},
abstractNote = {A stage for precise positioning of a chuck in three orthogonal linear axes and in three orthogonal rotation axes that includes first and second subassemblies. The a first subassembly includes (i) a monolithic mirror that supports the chuck wherein the monolithic mirror has at least two polished orthogonal faces for interferometric determination of the X, Y, and .THETA.z positions; (ii) a plurality of electromagnetic actuators that control fine positioning in all six axes and coarse positioning in one axis; (iii) a position sensor for measuring the vertical Z position of the monolithic mirror; and (iv) a Lorentz actuator, that includes magnet array, for effecting motion in the Y axis. The a second subassembly comprising a stepping axis beam over which the first subassembly is suspended, wherein the stepping axis beam includes a drive coil array for the Lorentz actuator. T the stage can also include a cable stage subassembly that is positioned a fixed distance away from the monolithic mirror and/or a mechanical zero reference for the first subassembly.},
doi = {},
journal = {},
number = ,
volume = ,
place = {United States},
year = {Tue Jan 01 00:00:00 EST 2002},
month = {Tue Jan 01 00:00:00 EST 2002}
}