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Title: Microfluidic channel fabrication method

Abstract

A new channel structure for microfluidic systems and process for fabricating this structure. In contrast to the conventional practice of fabricating fluid channels as trenches or grooves in a substrate, fluid channels are fabricated as thin walled raised structures on a substrate. Microfluidic devices produced in accordance with the invention are a hybrid assembly generally consisting of three layers: 1) a substrate that can or cannot be an electrical insulator; 2) a middle layer, that is an electrically conducting material and preferably silicon, forms the channel walls whose height defines the channel height, joined to and extending from the substrate; and 3) a top layer, joined to the top of the channels, that forms a cover for the channels. The channels can be defined by photolithographic techniques and are produced by etching away the material around the channel walls.

Inventors:
 [1];  [2];  [2]
  1. Livermore, CA
  2. Oakland, CA
Issue Date:
Research Org.:
Sandia National Laboratories (SNL), Albuquerque, NM, and Livermore, CA (United States)
OSTI Identifier:
873646
Patent Number(s):
6210986
Assignee:
Sandia Corporation (Livermore, CA)
Patent Classifications (CPCs):
B - PERFORMING OPERATIONS B01 - PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL B01L - CHEMICAL OR PHYSICAL LABORATORY APPARATUS FOR GENERAL USE
B - PERFORMING OPERATIONS B81 - MICROSTRUCTURAL TECHNOLOGY B81C - PROCESSES OR APPARATUS SPECIALLY ADAPTED FOR THE MANUFACTURE OR TREATMENT OF MICROSTRUCTURAL DEVICES OR SYSTEMS
DOE Contract Number:  
AC04-94AL85000
Resource Type:
Patent
Country of Publication:
United States
Language:
English
Subject:
microfluidic; channel; fabrication; method; structure; systems; process; fabricating; contrast; conventional; practice; fluid; channels; trenches; grooves; substrate; fabricated; walled; raised; structures; devices; produced; accordance; hybrid; assembly; consisting; layers; electrical; insulator; middle; layer; electrically; conducting; material; preferably; silicon; forms; walls; height; defines; joined; extending; top; cover; defined; photolithographic; techniques; etching; electrical insulator; fabrication method; conducting material; top layer; electrically conducting; microfluidic devices; channel structure; fluid channels; channel walls; microfluidic systems; fluidic devices; microfluidic channel; channel wall; conventional practice; /438/204/

Citation Formats

Arnold, Don W, Schoeniger, Joseph S, and Cardinale, Gregory F. Microfluidic channel fabrication method. United States: N. p., 2001. Web.
Arnold, Don W, Schoeniger, Joseph S, & Cardinale, Gregory F. Microfluidic channel fabrication method. United States.
Arnold, Don W, Schoeniger, Joseph S, and Cardinale, Gregory F. Mon . "Microfluidic channel fabrication method". United States. https://www.osti.gov/servlets/purl/873646.
@article{osti_873646,
title = {Microfluidic channel fabrication method},
author = {Arnold, Don W and Schoeniger, Joseph S and Cardinale, Gregory F},
abstractNote = {A new channel structure for microfluidic systems and process for fabricating this structure. In contrast to the conventional practice of fabricating fluid channels as trenches or grooves in a substrate, fluid channels are fabricated as thin walled raised structures on a substrate. Microfluidic devices produced in accordance with the invention are a hybrid assembly generally consisting of three layers: 1) a substrate that can or cannot be an electrical insulator; 2) a middle layer, that is an electrically conducting material and preferably silicon, forms the channel walls whose height defines the channel height, joined to and extending from the substrate; and 3) a top layer, joined to the top of the channels, that forms a cover for the channels. The channels can be defined by photolithographic techniques and are produced by etching away the material around the channel walls.},
doi = {},
journal = {},
number = ,
volume = ,
place = {United States},
year = {Mon Jan 01 00:00:00 EST 2001},
month = {Mon Jan 01 00:00:00 EST 2001}
}

Works referenced in this record:

Method for fabrication of microfluidic systems in glass
journal, March 1998


Création du Centre international d'études et de recherche Henri Wallon
journal, January 1998