Method for cleaning a solar cell surface opening made with a solar etch paste
Abstract
A thin silicon solar cell having a back dielectric passivation and rear contact with local back surface field is described. Specifically, the solar cell may be fabricated from a crystalline silicon wafer having a thickness from 50 to 500 micrometers. A barrier layer and a dielectric layer are applied at least to the back surface of the silicon wafer to protect the silicon wafer from deformation when the rear contact is formed. At least one opening is made to the dielectric layer. An aluminum contact that provides a back surface field is formed in the opening and on the dielectric layer. The aluminum contact may be applied by screen printing an aluminum paste having from one to 12 atomic percent silicon and then applying a heat treatment at 750 degrees Celsius.
- Inventors:
- Issue Date:
- Research Org.:
- Georgia Institute of Technology, Atlanta, GA (United States)
- Sponsoring Org.:
- USDOE
- OSTI Identifier:
- 1176386
- Patent Number(s):
- 7741225
- Application Number:
- 12/116,132
- Assignee:
- Georgia Tech Research Corporation (Atlanta, GA)
- Patent Classifications (CPCs):
-
H - ELECTRICITY H01 - BASIC ELECTRIC ELEMENTS H01L - SEMICONDUCTOR DEVICES
Y - NEW / CROSS SECTIONAL TECHNOLOGIES Y02 - TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE Y02E - REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
- DOE Contract Number:
- FC36-07GO17023
- Resource Type:
- Patent
- Resource Relation:
- Patent File Date: 2008 May 06
- Country of Publication:
- United States
- Language:
- English
- Subject:
- 36 MATERIALS SCIENCE; 14 SOLAR ENERGY
Citation Formats
Rohatgi, Ajeet, and Meemongkolkiat, Vichai. Method for cleaning a solar cell surface opening made with a solar etch paste. United States: N. p., 2010.
Web.
Rohatgi, Ajeet, & Meemongkolkiat, Vichai. Method for cleaning a solar cell surface opening made with a solar etch paste. United States.
Rohatgi, Ajeet, and Meemongkolkiat, Vichai. Tue .
"Method for cleaning a solar cell surface opening made with a solar etch paste". United States. https://www.osti.gov/servlets/purl/1176386.
@article{osti_1176386,
title = {Method for cleaning a solar cell surface opening made with a solar etch paste},
author = {Rohatgi, Ajeet and Meemongkolkiat, Vichai},
abstractNote = {A thin silicon solar cell having a back dielectric passivation and rear contact with local back surface field is described. Specifically, the solar cell may be fabricated from a crystalline silicon wafer having a thickness from 50 to 500 micrometers. A barrier layer and a dielectric layer are applied at least to the back surface of the silicon wafer to protect the silicon wafer from deformation when the rear contact is formed. At least one opening is made to the dielectric layer. An aluminum contact that provides a back surface field is formed in the opening and on the dielectric layer. The aluminum contact may be applied by screen printing an aluminum paste having from one to 12 atomic percent silicon and then applying a heat treatment at 750 degrees Celsius.},
doi = {},
journal = {},
number = ,
volume = ,
place = {United States},
year = {Tue Jun 22 00:00:00 EDT 2010},
month = {Tue Jun 22 00:00:00 EDT 2010}
}
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Works referenced in this record:
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