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Title: Electrolytic etch for preventing electrical shorts in solar cells on polymer surfaces

Abstract

A method for preventing shorts and shunts in solar cells having in order, an insulating substrate, a conductive metal layer on the substrate, an amorphous silicon layer and a transparent conductive layer. The method includes anodic etching of exposed portions of the metal layer after deposition of the amorphous silicon and prior to depositing the transparent conductive layer.

Inventors:
 [1]
  1. (St. Paul, MN)
Issue Date:
OSTI Identifier:
868014
Patent Number(s):
5055416
Application Number:
07/281,099
Assignee:
Minnesota Mining and Manufacturing Company (Saint Paul, MN) OSTI
DOE Contract Number:  
ZB-4-03056-2
Resource Type:
Patent
Country of Publication:
United States
Language:
English
Subject:
electrolytic; etch; preventing; electrical; shorts; solar; cells; polymer; surfaces; method; shunts; insulating; substrate; conductive; metal; layer; amorphous; silicon; transparent; anodic; etching; exposed; portions; deposition; prior; depositing; silicon layer; metal layer; amorphous silicon; solar cell; solar cells; conductive layer; electrical shorts; conductive metal; transparent conductive; polymer surface; insulating substrate; exposed portions; polymer surfaces; /438/136/205/

Citation Formats

Weber, Michael F. Electrolytic etch for preventing electrical shorts in solar cells on polymer surfaces. United States: N. p., 1991. Web.
Weber, Michael F. Electrolytic etch for preventing electrical shorts in solar cells on polymer surfaces. United States.
Weber, Michael F. Tue . "Electrolytic etch for preventing electrical shorts in solar cells on polymer surfaces". United States. https://www.osti.gov/servlets/purl/868014.
@article{osti_868014,
title = {Electrolytic etch for preventing electrical shorts in solar cells on polymer surfaces},
author = {Weber, Michael F.},
abstractNote = {A method for preventing shorts and shunts in solar cells having in order, an insulating substrate, a conductive metal layer on the substrate, an amorphous silicon layer and a transparent conductive layer. The method includes anodic etching of exposed portions of the metal layer after deposition of the amorphous silicon and prior to depositing the transparent conductive layer.},
doi = {},
journal = {},
number = ,
volume = ,
place = {United States},
year = {1991},
month = {10}
}

Patent:

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