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Title: Method of sputter etching a surface

Abstract

The surface of a target is textured by co-sputter etching the target surface with a seed material adjacent thereto, while the target surface is maintained at a pre-selected temperature. By pre-selecting the temperature of the surface while sputter etching, it is possible to predetermine the reflectance properties of the etched surface. The surface may be textured to absorb sunlight efficiently and have minimal emittance in the infrared region so as to be well-suited for use as a solar absorber for photothermal energy conversion.

Inventors:
 [1]
  1. (Seattle, WA)
Issue Date:
Research Org.:
Battelle Memorial Institute, Columbus, OH (United States)
OSTI Identifier:
864875
Patent Number(s):
4431499
Assignee:
United States of America as represented by United States (Washington, DC)
Patent Classifications (CPCs):
C - CHEMISTRY C23 - COATING METALLIC MATERIAL C23F - NON-MECHANICAL REMOVAL OF METALLIC MATERIAL FROM SURFACE
Y - NEW / CROSS SECTIONAL TECHNOLOGIES Y02 - TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE Y02E - REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
DOE Contract Number:  
AC06-76RL01830
Resource Type:
Patent
Country of Publication:
United States
Language:
English
Subject:
method; sputter; etching; surface; target; textured; co-sputter; seed; material; adjacent; thereto; maintained; pre-selected; temperature; pre-selecting; predetermine; reflectance; properties; etched; absorb; sunlight; efficiently; minimal; emittance; infrared; region; well-suited; solar; absorber; photothermal; energy; conversion; adjacent thereto; thermal energy; energy conversion; target surface; selected temperature; seed material; solar absorber; etched surface; sputter etching; infrared region; /204/

Citation Formats

Henager, Jr., Charles H. Method of sputter etching a surface. United States: N. p., 1984. Web.
Henager, Jr., Charles H. Method of sputter etching a surface. United States.
Henager, Jr., Charles H. Sun . "Method of sputter etching a surface". United States. https://www.osti.gov/servlets/purl/864875.
@article{osti_864875,
title = {Method of sputter etching a surface},
author = {Henager, Jr., Charles H.},
abstractNote = {The surface of a target is textured by co-sputter etching the target surface with a seed material adjacent thereto, while the target surface is maintained at a pre-selected temperature. By pre-selecting the temperature of the surface while sputter etching, it is possible to predetermine the reflectance properties of the etched surface. The surface may be textured to absorb sunlight efficiently and have minimal emittance in the infrared region so as to be well-suited for use as a solar absorber for photothermal energy conversion.},
doi = {},
journal = {},
number = ,
volume = ,
place = {United States},
year = {1984},
month = {1}
}

Patent:

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