Process for ion-assisted laser deposition of biaxially textured layer on substrate
Abstract
A process for depositing a biaxially aligned intermediate layer over a non-single crystal substrate is disclosed which permits the subsequent deposition thereon of a biaxially oriented superconducting film. The process comprises depositing on a substrate by laser ablation a material capable of being biaxially oriented and also capable of inhibiting the migration of substrate materials through the intermediate layer into such a superconducting film, while simultaneously bombarding the substrate with an ion beam. In a preferred embodiment, the deposition is carried out in the same chamber used to subsequently deposit a superconducting film over the intermediate layer. In a further aspect of the invention, the deposition of the superconducting layer over the biaxially oriented intermediate layer is also carried out by laser ablation with optional additional bombardment of the coated substrate with an ion beam during the deposition of the superconducting film. 8 figs.
- Inventors:
- Issue Date:
- Research Org.:
- Univ. of California (United States)
- OSTI Identifier:
- 87770
- Patent Number(s):
- 5432151
- Application Number:
- PAN: 8-090,422
- Assignee:
- Univ. of California, Oakland, CA (United States)
- DOE Contract Number:
- AC03-76SF00098
- Resource Type:
- Patent
- Resource Relation:
- Other Information: PBD: 11 Jul 1995
- Country of Publication:
- United States
- Language:
- English
- Subject:
- 36 MATERIALS SCIENCE; SUPERCONDUCTING FILMS; DEPOSITION; LASER RADIATION; ENERGY BEAM DEPOSITION; TEXTURE; ORIENTATION
Citation Formats
Russo, R E, Reade, R P, Garrison, S M, and Berdahl, P. Process for ion-assisted laser deposition of biaxially textured layer on substrate. United States: N. p., 1995.
Web.
Russo, R E, Reade, R P, Garrison, S M, & Berdahl, P. Process for ion-assisted laser deposition of biaxially textured layer on substrate. United States.
Russo, R E, Reade, R P, Garrison, S M, and Berdahl, P. Tue .
"Process for ion-assisted laser deposition of biaxially textured layer on substrate". United States.
@article{osti_87770,
title = {Process for ion-assisted laser deposition of biaxially textured layer on substrate},
author = {Russo, R E and Reade, R P and Garrison, S M and Berdahl, P},
abstractNote = {A process for depositing a biaxially aligned intermediate layer over a non-single crystal substrate is disclosed which permits the subsequent deposition thereon of a biaxially oriented superconducting film. The process comprises depositing on a substrate by laser ablation a material capable of being biaxially oriented and also capable of inhibiting the migration of substrate materials through the intermediate layer into such a superconducting film, while simultaneously bombarding the substrate with an ion beam. In a preferred embodiment, the deposition is carried out in the same chamber used to subsequently deposit a superconducting film over the intermediate layer. In a further aspect of the invention, the deposition of the superconducting layer over the biaxially oriented intermediate layer is also carried out by laser ablation with optional additional bombardment of the coated substrate with an ion beam during the deposition of the superconducting film. 8 figs.},
doi = {},
journal = {},
number = ,
volume = ,
place = {United States},
year = {Tue Jul 11 00:00:00 EDT 1995},
month = {Tue Jul 11 00:00:00 EDT 1995}
}