Dual ion beam assisted deposition of biaxially textured template layers
Patent
·
OSTI ID:1175368
The present invention is directed towards a process and apparatus for epitaxial deposition of a material, e.g., a layer of MgO, onto a substrate such as a flexible metal substrate, using dual ion beams for the ion beam assisted deposition whereby thick layers can be deposited without degradation of the desired properties by the material. The ability to deposit thicker layers without loss of properties provides a significantly broader deposition window for the process.
- Research Organization:
- Univ. of California, Oakland, CA (United States)
- Sponsoring Organization:
- USDOE
- DOE Contract Number:
- W-7405-ENG-36
- Assignee:
- The Regents of the University of California (Los Alamos, NM)
- Patent Number(s):
- 6,899,928
- Application Number:
- 10/208,086
- OSTI ID:
- 1175368
- Country of Publication:
- United States
- Language:
- English
Biaxially Textured IBAD-MgO Templates for YBCO-Coated Conductors
|
journal | August 2004 |
Research and Development of Biaxially Textured IBAD-GZO Templates for Coated Superconductors
|
journal | August 2004 |
Combined out-of-plane and in-plane texture control in thin films using ion beam assisted deposition
|
journal | January 2001 |
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