DOE Patents title logo U.S. Department of Energy
Office of Scientific and Technical Information

Title: Dual ion beam assisted deposition of biaxially textured template layers

Abstract

The present invention is directed towards a process and apparatus for epitaxial deposition of a material, e.g., a layer of MgO, onto a substrate such as a flexible metal substrate, using dual ion beams for the ion beam assisted deposition whereby thick layers can be deposited without degradation of the desired properties by the material. The ability to deposit thicker layers without loss of properties provides a significantly broader deposition window for the process.

Inventors:
; ;
Issue Date:
Research Org.:
Univ. of California, Oakland, CA (United States)
Sponsoring Org.:
USDOE
OSTI Identifier:
1175368
Patent Number(s):
6899928
Application Number:
10/208,086
Assignee:
The Regents of the University of California (Los Alamos, NM)
Patent Classifications (CPCs):
C - CHEMISTRY C30 - CRYSTAL GROWTH C30B - SINGLE-CRYSTAL-GROWTH
DOE Contract Number:  
W-7405-ENG-36
Resource Type:
Patent
Country of Publication:
United States
Language:
English
Subject:
47 OTHER INSTRUMENTATION

Citation Formats

Groves, James R., Arendt, Paul N., and Hammond, Robert H. Dual ion beam assisted deposition of biaxially textured template layers. United States: N. p., 2005. Web.
Groves, James R., Arendt, Paul N., & Hammond, Robert H. Dual ion beam assisted deposition of biaxially textured template layers. United States.
Groves, James R., Arendt, Paul N., and Hammond, Robert H. Tue . "Dual ion beam assisted deposition of biaxially textured template layers". United States. https://www.osti.gov/servlets/purl/1175368.
@article{osti_1175368,
title = {Dual ion beam assisted deposition of biaxially textured template layers},
author = {Groves, James R. and Arendt, Paul N. and Hammond, Robert H.},
abstractNote = {The present invention is directed towards a process and apparatus for epitaxial deposition of a material, e.g., a layer of MgO, onto a substrate such as a flexible metal substrate, using dual ion beams for the ion beam assisted deposition whereby thick layers can be deposited without degradation of the desired properties by the material. The ability to deposit thicker layers without loss of properties provides a significantly broader deposition window for the process.},
doi = {},
journal = {},
number = ,
volume = ,
place = {United States},
year = {2005},
month = {5}
}

Works referenced in this record:

Biaxially Textured IBAD-MgO Templates for YBCO-Coated Conductors
journal, August 2004


Research and Development of Biaxially Textured IBAD-GZO Templates for Coated Superconductors
journal, August 2004


Combined out-of-plane and in-plane texture control in thin films using ion beam assisted deposition
journal, January 2001