Reflective optical imaging system with balanced distortion

Chapman, Henry N; Hudyma, Russell M; Shafer, David R; Sweeney, Donald W

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Title: Reflective optical imaging system with balanced distortion

Abstract

An optical system compatible with short wavelength (extreme ultraviolet) An optical system compatible with short wavelength (extreme ultraviolet) radiation comprising four reflective elements for projecting a mask image onto a substrate. The four optical elements comprise, in order from object to image, convex, concave, convex and concave mirrors. The optical system is particularly suited for step and scan lithography methods. The invention enables the use of larger slit dimensions associated with ring field scanning optics, improves wafer throughput and allows higher semiconductor device density. The inventive optical system is characterized by reduced dynamic distortion because the static distortion is balanced across the slit width.

Inventors:

Chapman, Henry N ^[1]; Hudyma, Russell M ^[2]; Shafer, David R ^[3]; Sweeney, Donald W ^[2]

Sunol, CA
San Ramon, CA
Fairfield, CT

Issue Date:: Fri Jan 01 00:00:00 EST 1999

Research Org.:: Lawrence Livermore National Laboratory (LLNL), Livermore, CA (United States)

OSTI Identifier:: 872615

Patent Number(s):: 5973826

Assignee:: Regents of University of California (Oakland, CA)

Patent Classifications (CPCs):: G - PHYSICS G02 - OPTICS G02B - OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS

G - PHYSICS G03 - PHOTOGRAPHY G03F - PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES

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G - PHYSICS G02 - OPTICS G02B - OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS
G02B13/22 - Telecentric objectives or lens systems
G02B17/0657 - {off-axis or unobscured systems in which all of the mirrors share a common axis of rotational symmetry}

G - PHYSICS G03 - PHOTOGRAPHY G03F - PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES
G03F7/70233 - {Optical aspects of catoptric systems}

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DOE Contract Number:: W-7405-ENG-48

Resource Type:: Patent

Country of Publication:: United States

Language:: English

Subject:: reflective; optical; imaging; balanced; distortion; compatible; wavelength; extreme; ultraviolet; radiation; comprising; elements; projecting; mask; image; substrate; comprise; convex; concave; mirrors; particularly; suited; step; scan; lithography; methods; enables; larger; slit; dimensions; associated; field; scanning; optics; improves; wafer; throughput; allows; semiconductor; device; density; inventive; characterized; reduced; dynamic; static; width; reflective elements; concave mirrors; mask image; scan lithography; lithography methods; reflective optical; optical imaging; particularly suited; optical element; optical elements; extreme ultraviolet; semiconductor device; concave mirror; radiation comprising; reduced dynamic; slit width; reflective element; static distortion; slit dimensions; scanning optics; device density; wafer throughput; dimensions associated; improves wafer; dynamic distortion; field scanning; elements comprise; balanced distortion; /359/

Citation Formats


                    Chapman, Henry N, Hudyma, Russell M, Shafer, David R, and Sweeney, Donald W. Reflective optical imaging system with balanced distortion.  United States: N. p., 1999. 
        Web.

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                    Chapman, Henry N, Hudyma, Russell M, Shafer, David R, & Sweeney, Donald W. Reflective optical imaging system with balanced distortion.  United States.

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                    Chapman, Henry N, Hudyma, Russell M, Shafer, David R, and Sweeney, Donald W. Fri .  
        "Reflective optical imaging system with balanced distortion".  United States.  https://www.osti.gov/servlets/purl/872615.

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@article{osti_872615,

  title        = {Reflective optical imaging system with balanced distortion},

  author       = {Chapman, Henry N and Hudyma, Russell M and Shafer, David R and Sweeney, Donald W},

  abstractNote = {An optical system compatible with short wavelength (extreme ultraviolet) An optical system compatible with short wavelength (extreme ultraviolet) radiation comprising four reflective elements for projecting a mask image onto a substrate. The four optical elements comprise, in order from object to image, convex, concave, convex and concave mirrors. The optical system is particularly suited for step and scan lithography methods. The invention enables the use of larger slit dimensions associated with ring field scanning optics, improves wafer throughput and allows higher semiconductor device density. The inventive optical system is characterized by reduced dynamic distortion because the static distortion is balanced across the slit width.},

  doi          = {},

  journal      = {},
number       = ,

  volume       = ,

  place        = {United States},

  year         = {Fri Jan 01 00:00:00 EST 1999},

  month        = {Fri Jan 01 00:00:00 EST 1999}

}

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Works referenced in this record:

Design of reflective relay for soft x-ray lithography
conference, January 1991

Rodgers, J. Michael; Jewell, Tanya E.
1990 Intl Lens Design Conf, SPIE Proceedings
https://doi.org/10.1117/12.47916

Reflective systems design study for soft x-ray projection lithography
journal, November 1990

Jewell, Tanya E.
Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures, Vol. 8, Issue 6
https://doi.org/10.1116/1.585108

Optical system design issues in development of projection camera for EUV lithography
conference, May 1995

Jewell, Tanya E.
SPIE's 1995 Symposium on Microlithography, SPIE Proceedings
https://doi.org/10.1117/12.209170

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Reflective optical imaging systems with balanced distortion

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Optical systems compatible with extreme ultraviolet radiation comprising four reflective elements for projecting a mask image onto a substrate are described. The four optical elements comprise, in order from object to image, convex, concave, convex and concave mirrors. The optical systems are particularly suited for step and scan lithography methods. The invention enables the use of larger slit dimensions associated with ring field scanning optics, improves wafer throughput, and allows higher semiconductor device density. The inventive optical systems are characterized by reduced dynamic distortion because the static distortion is balanced across the slit width.
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An optical system compatible with short wavelength (extreme ultraviolet) radiation comprising four reflective elements for projecting a mask image onto a substrate is disclosed. The four optical elements comprise, in order from object to image, convex, concave, convex and concave mirrors. The optical system is particularly suited for step and scan lithography methods. The invention enables the use of larger slit dimensions associated with ring field scanning optics, improves wafer throughput and allows higher semiconductor device density. The inventive optical system is characterized by reduced dynamic distortion because the static distortion is balanced across the slit width.
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An optical system compatible with short wavelength (extreme ultraviolet) radiation comprising four reflective elements for projecting a mask image onto a substrate. The four optical elements are characterized in order from object to image as convex, concave, convex and concave mirrors. The optical system is particularly suited for step and scan lithography methods. The invention increases the slit dimensions associated with ringfield scanning optics, improves wafer throughput and allows higher semiconductor device density.
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A projection reflection optical system has two mirrors in a coaxial, four reflection configuration to reproduce the image of an object. The mirrors have spherical reflection surfaces to provide a very high resolution of object feature wavelengths less than 200 .mu.m, and preferably less than 100 .mu.m. An image resolution of features less than 0.05-0.1 .mu.m, is obtained over a large area field; i.e., 25.4 mm .times.25.4 mm, with a distortion less than 0.1 of the resolution over the image field.
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An optical system compatible with short wavelength (extreme ultraviolet) radiation comprising four reflective elements for projecting a mask image onto a substrate. The four optical elements are characterized in order from object to image as convex, concave, convex and concave mirrors. The optical system is particularly suited for step and scan lithography methods. The invention increases the slit dimensions associated with ringfield scanning optics, improves wafer throughput and allows higher semiconductor device density.
Full Text Available

Similar Records

Title: Reflective optical imaging system with balanced distortion

Abstract

Citation Formats

Design of reflective relay for soft x-ray lithography conference, January 1991

Reflective systems design study for soft x-ray projection lithography journal, November 1990

Optical system design issues in development of projection camera for EUV lithography conference, May 1995

Design of reflective relay for soft x-ray lithography
conference, January 1991

Reflective systems design study for soft x-ray projection lithography
journal, November 1990

Optical system design issues in development of projection camera for EUV lithography
conference, May 1995