Reflective optical imaging method and circuit
Abstract
An optical system compatible with short wavelength (extreme ultraviolet) radiation comprising four reflective elements for projecting a mask image onto a substrate. The four optical elements are characterized in order from object to image as convex, concave, convex and concave mirrors. The optical system is particularly suited for step and scan lithography methods. The invention increases the slit dimensions associated with ringfield scanning optics, improves wafer throughput and allows higher semiconductor device density.
- Inventors:
-
- Fairfield, CT
- Issue Date:
- Research Org.:
- Lawrence Livermore National Laboratory (LLNL), Livermore, CA (United States)
- OSTI Identifier:
- 873869
- Patent Number(s):
- 6262826
- Assignee:
- Regents of University of California (Oakland, CA)
- Patent Classifications (CPCs):
-
G - PHYSICS G02 - OPTICS G02B - OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS
G - PHYSICS G03 - PHOTOGRAPHY G03F - PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES
- DOE Contract Number:
- W-7405-ENG-48
- Resource Type:
- Patent
- Country of Publication:
- United States
- Language:
- English
- Subject:
- reflective; optical; imaging; method; circuit; compatible; wavelength; extreme; ultraviolet; radiation; comprising; elements; projecting; mask; image; substrate; characterized; convex; concave; mirrors; particularly; suited; step; scan; lithography; methods; increases; slit; dimensions; associated; ringfield; scanning; optics; improves; wafer; throughput; allows; semiconductor; device; density; reflective elements; concave mirrors; mask image; scan lithography; lithography methods; reflective optical; optical imaging; particularly suited; optical element; optical elements; extreme ultraviolet; semiconductor device; concave mirror; radiation comprising; reflective element; slit dimensions; scanning optics; device density; wafer throughput; imaging method; dimensions associated; improves wafer; field scanning; /359/
Citation Formats
Shafer, David R. Reflective optical imaging method and circuit. United States: N. p., 2001.
Web.
Shafer, David R. Reflective optical imaging method and circuit. United States.
Shafer, David R. Mon .
"Reflective optical imaging method and circuit". United States. https://www.osti.gov/servlets/purl/873869.
@article{osti_873869,
title = {Reflective optical imaging method and circuit},
author = {Shafer, David R},
abstractNote = {An optical system compatible with short wavelength (extreme ultraviolet) radiation comprising four reflective elements for projecting a mask image onto a substrate. The four optical elements are characterized in order from object to image as convex, concave, convex and concave mirrors. The optical system is particularly suited for step and scan lithography methods. The invention increases the slit dimensions associated with ringfield scanning optics, improves wafer throughput and allows higher semiconductor device density.},
doi = {},
journal = {},
number = ,
volume = ,
place = {United States},
year = {2001},
month = {1}
}
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Works referenced in this record:
Design of reflective relay for soft x-ray lithography
conference, January 1991
- Rodgers, J. Michael; Jewell, Tanya E.
- 1990 Intl Lens Design Conf, SPIE Proceedings
Reflective systems design study for soft x-ray projection lithography
journal, November 1990
- Jewell, Tanya E.
- Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures, Vol. 8, Issue 6