Reflective optical imaging systems with balanced distortion
Abstract
Optical systems compatible with extreme ultraviolet radiation comprising four reflective elements for projecting a mask image onto a substrate are described. The four optical elements comprise, in order from object to image, convex, concave, convex and concave mirrors. The optical systems are particularly suited for step and scan lithography methods. The invention enables the use of larger slit dimensions associated with ring field scanning optics, improves wafer throughput, and allows higher semiconductor device density. The inventive optical systems are characterized by reduced dynamic distortion because the static distortion is balanced across the slit width.
- Inventors:
-
- San Ramon, CA
- Issue Date:
- Research Org.:
- Lawrence Livermore National Laboratory (LLNL), Livermore, CA (United States)
- OSTI Identifier:
- 873706
- Patent Number(s):
- 6226346
- Assignee:
- Regents of University of California (Oakland, CA)
- Patent Classifications (CPCs):
-
G - PHYSICS G02 - OPTICS G02B - OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS
G - PHYSICS G03 - PHOTOGRAPHY G03F - PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES
- DOE Contract Number:
- W-7405-ENG-48
- Resource Type:
- Patent
- Country of Publication:
- United States
- Language:
- English
- Subject:
- reflective; optical; imaging; systems; balanced; distortion; compatible; extreme; ultraviolet; radiation; comprising; elements; projecting; mask; image; substrate; described; comprise; convex; concave; mirrors; particularly; suited; step; scan; lithography; methods; enables; larger; slit; dimensions; associated; field; scanning; optics; improves; wafer; throughput; allows; semiconductor; device; density; inventive; characterized; reduced; dynamic; static; width; reflective elements; concave mirrors; mask image; scan lithography; lithography methods; reflective optical; optical imaging; optical systems; particularly suited; ultraviolet radiation; optical element; optical elements; extreme ultraviolet; semiconductor device; concave mirror; radiation comprising; reduced dynamic; slit width; reflective element; static distortion; slit dimensions; scanning optics; device density; wafer throughput; dimensions associated; imaging systems; improves wafer; dynamic distortion; field scanning; elements comprise; balanced distortion; /378/
Citation Formats
Hudyma, Russell M. Reflective optical imaging systems with balanced distortion. United States: N. p., 2001.
Web.
Hudyma, Russell M. Reflective optical imaging systems with balanced distortion. United States.
Hudyma, Russell M. Mon .
"Reflective optical imaging systems with balanced distortion". United States. https://www.osti.gov/servlets/purl/873706.
@article{osti_873706,
title = {Reflective optical imaging systems with balanced distortion},
author = {Hudyma, Russell M},
abstractNote = {Optical systems compatible with extreme ultraviolet radiation comprising four reflective elements for projecting a mask image onto a substrate are described. The four optical elements comprise, in order from object to image, convex, concave, convex and concave mirrors. The optical systems are particularly suited for step and scan lithography methods. The invention enables the use of larger slit dimensions associated with ring field scanning optics, improves wafer throughput, and allows higher semiconductor device density. The inventive optical systems are characterized by reduced dynamic distortion because the static distortion is balanced across the slit width.},
doi = {},
journal = {},
number = ,
volume = ,
place = {United States},
year = {Mon Jan 01 00:00:00 EST 2001},
month = {Mon Jan 01 00:00:00 EST 2001}
}
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Works referenced in this record:
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